Abstract
The earlier developed original experimental technique for measuring and analyzing the parameters of low-frequency fluctuations of the field-emission current in metal film systems is used to measure the sputtering yield Y f of carbon films (with a coverage Θ ranging from 1 to 4) applied on Fe, Nb, Ta, and U substrates. The value of Y f is calculated by an expression derived within a theoretical model developed. The sputtering ratios were measured for the case when the carbon films are sputtered by H+ and He+ ions with an energy E i between 2 and 10 keV. With Θ fixed, the energy dependences of Y f are obtained for each of the ions. In addition, for each of the ions, the Θ dependences of Y f are found for several values of E i. In all the cases, the measured values of Y f far exceed those for pure carbon. With another original technique that combines field-ion microscopy (FIM) and precise measurement of current and/or luminous properties of local regions in FIM images, the energy thresholds E th of sputtering carbon films applied on the metal surfaces are found. The energy distributions of Y f in the near-threshold energy range for various Θ are obtained.
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Translated from Zhurnal Tekhnichesko\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \) Fiziki, Vol. 73, No. 1, 2003, pp. 110–116.
Original Russian Text Copyright © 2003 by Suvorov, Babaev, A.G. Zaluzhnyi, Devyatko, Lazarev, A.A. Zaluzhnyi.
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Suvorov, A.L., Babaev, V.P., Zaluzhnyi, A.G. et al. Stability of subatomic carbon films on metal surfaces against low-energy gas ion bombardment. Tech. Phys. 48, 104–109 (2003). https://doi.org/10.1134/1.1538737
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DOI: https://doi.org/10.1134/1.1538737