Abstract
Ignition conditions and the characteristics of a repetitive volume discharge with a spherical anode and plane cathode are investigated. The discharge was ignited in Ar/Cl2 mixtures (P≤2.0 kPa) used in excimer halogen lamps operating on the ArCl (B-X) 175-nm, Cl2(D′-A′) 257-nm, and Cl **2 195-to 200-nm molecular bands. At an interelectrode distance of 3 cm and a dc anode voltage of U ch ≤1 kV, a stable repetitive pulsed discharge with a repetition rate of 1–50 kHz was ignited in chlorine or (0.1–2.0)/(0.04–0.12)-kPa Ar/Cl2 mixtures. The development of attachment instability in the discharge plasma, in which the processes of the formation, decay, and diffusion of the Cl −2 and Cl− negative ions play an important role, leads to the formation of a solitary pearlike plasma domain with an average diameter of 0.2–3.5 cm.
References
A. P. Golovitskii, Pis’ma Zh. Tekh. Fiz. 18(8), 73 (1992) [Sov. Tech. Phys. Lett. 18, 269 (1992)].
A. N. Panchenko, V. S. Skakun, É. A. Sosnin, et al., Pis’ma Zh. Tekh. Fiz. 21(20), 77 (1995) [Tech. Phys. Lett. 21, 851 (1995)].
M. I. Lomaev, A. N. Panchenko, and É. A. Sosnin, Zh. Tekh. Fiz. 68(2), 64 (1998) [Tech. Phys. 43, 192 (1998)].
A. K. Shuaibov, A. I. Dashchenko, and I. V. Shevera, Kvantovaya Élektron. (Moscow) 31, 371 (2001).
A. K. Shuaibov, A. I. Dashchenko, and I. V. Shevera, Zh. Tekh. Fiz. 71(8), 121 (2001) [Tech. Phys. 46, 1049 (2001)].
H. Kumagai and M. A. Obara, Jpn. J. Appl. Phys. 28, 2228 (1989).
V. S. Rogulich, V. P. Starodub, and V. S. Shevera, Opt. Spektrosk. 69, 756 (1990) [Opt. Spectrosc. 69, 450 (1990)].
A. A. Alekhin, V. A. Barinov, Yu. V. Geras’ko, et al., Zh. Tekh. Fiz. 65(5), 9 (1995) [Tech. Phys. 40, 409 (1995)].
É. A. Sosnin and V. F. Tarasenko, Zh. Tekh. Fiz. 67(12), 43 (1997) [Tech. Phys. 42, 1411 (1997)].
Yu. S. Akishev, A. L. Napartovich, and S. V. Pashkin, Fiz. Plazmy 4, 152 (1978) [Sov. J. Plasma Phys. 4, 86 (1978)].
V. L. Aleksandrov, I. V. Kochetov, D. A. Mazalov, and A. P. Napartovich, Fiz. Plazmy 18, 1468 (1992) [Sov. J. Plasma Phys. 18, 758 (1992)].
A. L. Vykharev, O. A. Ivanov, L. S. Ivanova, et al., Zh. Tekh. Fiz. 59(1), 40 (1989) [Sov. Phys. Tech. Phys. 34, 22 (1989)].
V. L. Aleksandrov and A. P. Napartovich, Usp. Fiz. Nauk 163(3), 1 (1993) [Phys. Usp. 36, 107 (1993)].
V. S. Golubev and S. V. Pashkin, Elevated-Pressure Glow Discharge (Nauka, Moscow, 1990).
A. K. Shuaibov, L. L. Shimon, A. I. Dashchenko, and I. V. Shevera, J. Phys. Stud. 5(2), 131 (2001).
A. K. Shuaibov, L. L. Shimon, A. I. Dashchenko, and I. V. Shevera, Pis’ma Zh. Tekh. Fiz. 27(9), 8 (2001) [Tech. Phys. Lett. 27, 354 (2001)].
A. K. Shuaibov, Zh. Tekh. Fiz. 70(10), 117 (2000) [Tech. Phys. 45, 1346 (2000)].
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Translated from Zhurnal Tekhnichesko\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \) Fiziki, Vol. 72, No. 10, 2002, pp. 138–142.
Original Russian Text Copyright © 2002 by Shuaibov.
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Shuaibov, A.K. Repetitive low-pressure volume discharge induced by attachment instability in an Ar/Cl2 mixture. Tech. Phys. 47, 1341–1344 (2002). https://doi.org/10.1134/1.1514820
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DOI: https://doi.org/10.1134/1.1514820