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Subnormal glow discharge in a Xe/Cl2 mixture in a narrow discharge tube

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Abstract

Electrical and optical characteristics of a subnormal glow discharge in a short (L=10 cm) discharge tube with an inner diameter of 5 mm are investigated. The dependences of the discharge current-voltage characteristic, the energy deposition in the discharge, the plasma spectral characteristics in the 130-to 350-nm wavelength range, the emission intensities of the XeCl(D-X) 236-nm and XeCl(B-X) 308-nm bands, and the total emission intensity in the range 180–340 nm on the pressure and composition of the Xe/Cl2 mixture are studied. Two modes of glow discharge are shown to exist: the low-current mode at a discharge current of I ch ≤2 mA and the high-current mode at I ch >2 mA. The transition from one mode to another occurs in a stepwise manner. The increase in the chlorine content causes the discharge voltage and the energy deposition in the plasma to increase. At low pressures of the Xe/Cl2 mixture (P≤0.7 kPa), stationary strata form in the cathode region. The lower the discharge current, the greater the volume occupied by the strata. This longitudinal discharge acts as a powerful source of continuous broadband emission in the range 180–340 nm, which forms due to overlapping the XeCl(D, B-X) and Cl *2 bands with edges at λ=236, 308, and 258 nm. The intensity of the 236-nm band is at most 20% of the total intensity of UV radiation. The maximum power of UV radiation (3 W at an efficiency of 8%) is attained at a xenon partial pressure of 250–320 Pa and a total pressure of the mixture of 2 kPa.

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References

  1. V. V. Zaitsev, E. Yu. Zverevskaya, Ya. I. Zukher, and P. D. Netyagov, Teplofiz. Vys. Temp. 16, 1152 (1978).

    Google Scholar 

  2. V. V. Zaitsev, P. D. Netyagov, and N. V. Bozhko, Teplofiz. Vys. Temp. 18, 944 (1980).

    Google Scholar 

  3. B. S. Danilin and V. Yu. Kireev, Application of Lowtemperature Plasma for Etching and Cleaning Materials (Énergoatomizdat, Moscow, 1987).

    Google Scholar 

  4. A. M. Efremov, A. I. Kupriyanovskaya, and V. I. Svettsov, Khim. Vys. Énerg. 27(1), 88 (1993).

    Google Scholar 

  5. A. P. Golovitskii, Pis’ma Zh. Tekh. Fiz. 18(8), 73 (1992) [Sov. Tech. Phys. Lett. 18, 269 (1992)].

    Google Scholar 

  6. A. P. Golovitskii and S. N. Kan, Opt. Spektrosk. 75, 604 (1993) [Opt. Spectrosc. 75, 357 (1993)].

    Google Scholar 

  7. A. P. Golovitskii and S. V. Lebedev, Opt. Spektrosk. 82, 251 (1997) [Opt. Spectrosc. 82, 227 (1997)].

    Google Scholar 

  8. Yu. P. Raizer, Gas Discharge Physics (Nauka, Moscow, 1987; Springer-Verlag, Berlin, 1991).

    Google Scholar 

  9. A. N. Panchenko and V. F. Tarasenko, Opt. Spektrosk. 84, 389 (1998) [Opt. Spectrosc. 84, 337 (1998)].

    Google Scholar 

  10. A. K. Shuaibov, L. L. Shimon, A. I. Dashchenko, et al., Pis’ma Zh. Tekh. Fiz. 25(11), 29 (1999) [Tech. Phys. Lett. 25, 433 (1999)].

    Google Scholar 

  11. A. K. Shuaibov, L. L. Shimon, A. I. Dashchenko, and I. V. Shevera, in Problems of Economical and Social Development of the Region and the Practice of Scientific Experiments (Karpaty, Kiev, 2000), Vol. 16, p. 185.

    Google Scholar 

  12. A. K. Shuaibov, Pis’ma Zh. Tekh. Fiz. 26(9), 1 (2000) [Tech. Phys. Lett. 26, 357 (2000)].

    Google Scholar 

  13. A. K. Shuaibov and A. I. Dashchenko, Kvantovaya Élektron. (Moscow) 30, 279 (2000).

    Google Scholar 

  14. A. K. Shuaibov and A. I. Dashchenko, Prib. Tekh. Éksp., No. 3, 101 (2000).

  15. M. I. Lomaev, A. N. Panchenko, É. A. Sosnin, and V. F. Tarasenko, Zh. Tekh. Fiz. 68(2), 64 (1998) [Tech. Phys. 43, 192 (1998)].

    Google Scholar 

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Translated from Zhurnal Tekhnichesko\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \) Fiziki, Vol. 71, No. 8, 2001, pp. 121–124.

Original Russian Text Copyright © 2001 by Shuaibov, Dashchenko, Shevera.

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Shuaibov, A.K., Dashchenko, A.I. & Shevera, I.V. Subnormal glow discharge in a Xe/Cl2 mixture in a narrow discharge tube. Tech. Phys. 46, 1049–1052 (2001). https://doi.org/10.1134/1.1395129

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