Abstract
Adsorption of PCl3 molecules on the (100)W surface has been studied over a wide temperature range from 300 to 2000 K. It is shown that adsorption at T>1100 K results in the formation of a surface tungsten phosphide with the WP composition and a surface concentration of phosphorus atoms of (1±0.15)×1015 cm−2. Adsorption of silicon atoms on the surface phosphide at 1300 K results in the displacement of phosphorus atoms from the surface and their replacement by silicon atoms.
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Translated from Pis’ma v Zhurnal Tekhnichesko\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l}\) Fiziki, Vol. 26, No. 12, 2000, pp. 31–39.
Original Russian Text Copyright © 2000 by Gall, Rut’kov, Tontegode.
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Gall, N.R., Rut’kov, E.V. & Tontegode, A.Y. The formation and properties of surface phosphide on (100)W. Tech. Phys. Lett. 26, 510–513 (2000). https://doi.org/10.1134/1.1262894
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DOI: https://doi.org/10.1134/1.1262894