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Influence of substrate thickness on plasma resonance in a semiconductor heterostructure with a two-dimensional electron gas

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Abstract

A strict electrodynamic approach is used to analyze the excitation of oscillations of a two-dimensional electron plasma by an external plane electromagnetic wave in a semiconductor heterostructure with a grating coupling element. An analysis is made of the influence of the substrate thickness on the resonance magnitude and the profile of the resonance curve.

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Authors and Affiliations

  1. Institute of Radio Engineering and Electronics, Russian Academy of Sciences (Saratov Branch), Saratov

    V. V. Popov & G. M. Tsymbalov

Authors
  1. V. V. Popov
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  2. G. M. Tsymbalov
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Additional information

Pis’ma Zh. Tekh. Fiz. 24, 70–74 (May 12, 1998)

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Popov, V.V., Tsymbalov, G.M. Influence of substrate thickness on plasma resonance in a semiconductor heterostructure with a two-dimensional electron gas. Tech. Phys. Lett. 24, 361–362 (1998). https://doi.org/10.1134/1.1262122

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  • DOI: https://doi.org/10.1134/1.1262122

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