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Influence of low-temperature annealing on the properties of Y1Ba2Cu3O7−δ thin films

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Abstract

The influence of annealing at 180 °C on the structure, critical temperature, and electrical resistivity of Y1Ba2Cu3O7−δ thin films has been investigated. It is shown that films grown at reduced temperatures are sensitive to this annealing, which can substantially alter these film parameters.

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Authors and Affiliations

  1. Institute of Physics of Microstructures, Russian Academy of Sciences, Nizhnii Novgorod

    Yu. N. Drozdov, S. A. Pavlov & A. E. Parafin

Authors
  1. Yu. N. Drozdov
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  2. S. A. Pavlov
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  3. A. E. Parafin
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Additional information

Pis’ma Zh. Tekh. Fiz. 24, 55–58 (January 12, 1998)

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Drozdov, Y.N., Pavlov, S.A. & Parafin, A.E. Influence of low-temperature annealing on the properties of Y1Ba2Cu3O7−δ thin films. Tech. Phys. Lett. 24, 24–25 (1998). https://doi.org/10.1134/1.1261978

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  • DOI: https://doi.org/10.1134/1.1261978

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