Abstract
A method of microdoping subsurface semiconductor layers with hydrogen ions (protons) with the use of a plasma-beam discharge is suggested. The method was tested on gallium arsenide layers and was proven to be more efficient than other well-known methods used for modifying subsurface layers.
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Translated from Zhurnal Tekhnichesko\(\overset{\lower0.5em\hbox{$\smash{\scriptscriptstyle\smile}$}}{l} \) Fiziki, Vol. 70, No. 2, 2000, pp. 118–120.
Original Russian Text Copyright © 2000 by Anisimov, Demkin, Kvint, Mel’nichuk, Semukhin.
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Anisimov, V.V., Demkin, V.P., Kvint, I.A. et al. Microdoping of subsurface gallium arsenide layers with hydrogen ions. Tech. Phys. 45, 260–262 (2000). https://doi.org/10.1134/1.1259609
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DOI: https://doi.org/10.1134/1.1259609