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Skin effect during propagation of high-power short-wavelength microwaves in a partially ionized semiconductor plasma

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Abstract

A study is made of the propagation of high-power electromagnetic waves in spatially inhomogeneous plasmas of thin semiconducting elements and films. The effect of surface recombination and an external magnetic field on the depth of penetration of an ionizing field into the semiconductor plasma is examined.

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Zh. Tekh. Fiz. 69, 135–136 (May 1999)

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Kosygin, O.A., Chupis, V.N. & Somov, A.Y. Skin effect during propagation of high-power short-wavelength microwaves in a partially ionized semiconductor plasma. Tech. Phys. 44, 602–603 (1999). https://doi.org/10.1134/1.1259393

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  • DOI: https://doi.org/10.1134/1.1259393

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