Abstract
A new theoretical model is proposed to describe the behavior of films of composite hydrogen-containing compounds during heat treatment. The model is based on the thermal generation of hydrogen atoms and atoms of the composite compounds with their subsequent diffusion to the boundaries of the film and percolation through the surface into the atmosphere. Calculations are performed for the heat treatment of films of silicon nitride. A comparison with the experimental data in the literature demonstrates the high efficiency of the proposed model.
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Zh. Tekh. Fiz. 67, 105–110 (August 1997)
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Gadiyak, G.V., Gadiyak, V.G., Kosinova, M.L. et al. Theoretical model for describing degradation of thin hydrogen-containing films. Tech. Phys. 42, 950–955 (1997). https://doi.org/10.1134/1.1258760
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DOI: https://doi.org/10.1134/1.1258760