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A new universal method of monitoring layer parameters and surface roughness in vacuum deposition and etching processes

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Authors and Affiliations

  1. Institute of Radio Engineering and Electronics, Russian Academy of Sciences, 103907, Moscow, Russia

    A. M. Baranov, S. A. Tereshin & I. F. Mikhailov

Authors
  1. A. M. Baranov
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  2. S. A. Tereshin
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  3. I. F. Mikhailov
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Zh. Tekh. Fiz. 67, 62–64 (August 1997)

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Baranov, A.M., Tereshin, S.A. & Mikhailov, I.F. A new universal method of monitoring layer parameters and surface roughness in vacuum deposition and etching processes. Tech. Phys. 42, 910–912 (1997). https://doi.org/10.1134/1.1258734

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  • DOI: https://doi.org/10.1134/1.1258734

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