Properties of the interaction of europium with Si(111) surface

Abstract

Formation of the Eu/Si(111) system as the metal layer thickness gradually increases from 0.5 to 60 monolayers (ML) deposited on the silicon surface at room temperature, and after heating at up to 900 °C, has been studied by Auger electron spectroscopy, electron-energy-loss spectroscopy, and low-energy-electron diffraction. It is shown that room-temperature film growth passes through three stages, depending on the Eu layer thickness: metal chemisorption, interdiffusion of the metal and substrate atoms, and buildup of the metal on the surface of the system. Heating of ultrathin (about one ML) Eu films deposited at room temperature results in ordering of metal atoms on the silicon surface with only weak interaction. Heating thick (above 15 ML) Eu layers on the silicon surface produces silicides whose structure depends on the heating temperature.