Nanotechnologies in Russia

, Volume 5, Issue 5–6, pp 313–319 | Cite as

Formation of integrated nanosized graphene structures by focused ion-beam etching

  • I. I. Bobrinetskii
  • K. V. Gorshkov
  • V. K. Nevolin
  • K. A. Tsarik


Ion-beam methods of nanostructure formation in multigraphene layers integrated with a system of current-carrying electrodes during microelectronic group processing have been developed. The results demonstrate the feasibility of both thinning the structures down to several graphene layers and forming quasione-dimensional strips on the basis of the structures.


Golden Electrode Etch Depth Dimensional Atomic Force Microscopy Image Ented Pyrolytic Graphite Nanometric Thick Film 


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Copyright information

© Pleiades Publishing, Ltd. 2010

Authors and Affiliations

  • I. I. Bobrinetskii
    • 1
  • K. V. Gorshkov
    • 1
  • V. K. Nevolin
    • 1
  • K. A. Tsarik
    • 1
  1. 1.Moscow Institute of Electronic Technology (Technical University)MoscowRussia

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