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Glass Physics and Chemistry

, Volume 42, Issue 5, pp 490–496 | Cite as

Synthesis of Si–C–N–Fe films from volatile organosilicon substances-precursors and ferrocene. Part II. Properties of SiC x N y Fe z films obtained by thermal decomposition of tris(diethylamino)silane and ferrocene

  • R. V. PushkarevEmail author
  • N. I. Fainer
  • A. N. Golubenko
  • Yu. M. Rumyantsev
  • V. A. Nadolinnyi
  • E. A. Maksimovskii
  • E. V. Korotaev
  • V. V. Kaichev
Article

Abstract

Thermodynamic modeling of the deposition of condensed phases of complex composition has been carried out in the Si–C–N–Fe–H–(He) system in the temperature range of 500–1300 K under total pressure of 10–2–10–1 Torr in the system using initial gas mixture of tris(diethylamino)silane HSi[N(C2H5)2]3, ferrocene (C5H5)2Fe, and helium. Derived from the results of thermodynamic modeling, the method for the preparation of SiC x N y Fe z films using the high-temperature decomposition of the gas mixture of TDEAS, ferrocene, and helium at low pressure in the temperature range of 1073–1273 K has been developed. The dependence of the chemical and phase composition of the films on the conditions of synthesis has been determined using various methods of chemical analysis such as IR spectroscopy, Raman scattering, scanning electron microscopy, energy dispersion spectroscopy, X-ray phase analysis using synchrotron radiation, and X-ray photoelectron spectroscopy (XPS). The magnetic properties of the films have been studied by Faraday’s method and electron paramagnetic resonance. It has been shown that the films are paramagnetic at the temperature of synthesis of 1123 K, while at the deposition temperature of 1273 K they are ferromagnetic. The mechanical properties of the films were characterized by nanoindentation technique.

Keywords

thermodynamic modeling tris(diethylamino)silane ferrocene low-pressure chemical vapor deposition of films nanocomposite films 

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Copyright information

© Pleiades Publishing, Ltd. 2016

Authors and Affiliations

  • R. V. Pushkarev
    • 1
    Email author
  • N. I. Fainer
    • 1
  • A. N. Golubenko
    • 2
  • Yu. M. Rumyantsev
    • 1
  • V. A. Nadolinnyi
    • 1
  • E. A. Maksimovskii
    • 1
  • E. V. Korotaev
    • 1
  • V. V. Kaichev
    • 2
    • 3
  1. 1.Nikolaev Institute of Inorganic Chemistry, Siberian BranchRussian Academy of SciencesNovosibirskRussia
  2. 2.Novosibirsk National Research State UniversityNovosibirskRussia
  3. 3.Boreskov Institute of Catalysis, Siberian BranchRussian Academy of SciencesNovosibirskRussia

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