Technical Physics Letters

, Volume 32, Issue 9, pp 735–737 | Cite as

Effect of substrate material on the structure of carbon films obtained by plasmachemical deposition

  • A. V. Tyurnina
  • A. A. Zolotukhin
  • A. N. Obraztsov
Article
  • 25 Downloads

Abstract

Carbon films were obtained on nickel and silicon substrates by plasmachemical deposition from a hydrogen-methane gas mixture activated by dc discharge. The deposits were characterized by Raman scattering and scanning electron microscopy. Nanographite films on nickel are formed at a significantly lower substrate temperature and methane concentration in the gas phase than on silicon.

PACS numbers

81.15.Jh 

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Copyright information

© Pleiades Publishing, Inc. 2006

Authors and Affiliations

  • A. V. Tyurnina
    • 1
  • A. A. Zolotukhin
    • 1
  • A. N. Obraztsov
    • 1
  1. 1.Department of PhysicsMoscow State UniversityMoscowRussia

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