Abstract
Pt films with thickness h = 20–100 nm deposited on oxidized с-Si(100) substrate have been subjected to vacuum annealing at 500°C for 1 h, which resulted in recrystallization and growth of grains. Simultaneously with the normal growth of grains, abnormal grain growth has been observed, as a result of which the grains have separated in normal and secondary grains. For h = 20–40 nm, the secondary grains become much larger than the normal ones and the grain lateral size distribution therefore becomes bimodal. It has been shown that the abnormal grain growth rate increases with decreasing h, whereas the normal grain growth rate is independent of h. From the Pt(111) and Pt(222) X-ray diffraction peaks analysis it follows that the mean size D of coherently diffracting domains increases as a result of annealing. In the annealed films, D sublinearly grows with h, whereas in the as-prepared films, D grows linearly.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
N. Izyumskaya, Y.-I. Alivov, S.-J. Cho, H. Morcoc, H. Lee, and Y.-S. Kang, Crit. Rev. Solid State Mater. Sci. 32, 111 (2007). doi 10.1080/10408430701707347
K. A. Vorotilov, O. M. Zhigalina, V. A. Vasil’ev, and A. S. Sigov, Phys. Solid State 51, 1337 (2009). doi 10.1134/S106378340907004X
J. Hong, H. W. Song, H. C. Lee, W. J. Lee, and K. No, J. Appl. Phys. 90, 1962 (2001). doi 10.1063/1.1385358
M. Matsumiya, W. Shin, N. Izu, and N. Murayama, Sens. Actuators, B 93, 309 (2003). doi 10.1016/S0925-4005(03)00223-5
M. Ali, V. Cimalla, V. Lebedev, H. Romanusa, V. Tilak, D. Merfeld, P. Sandvik, and O. Ambacher, Sens. Actuators, B 113, 797 (2006). doi 10.1016/j.snb.2005.03.019
Z. Huang, W. Zhou, and X. Tang, Appl. Surf. Sci. 256, 2025 (2010). doi 10.1016/j.apsusc.2009.09.042
D. Resnik, D. Vrtacnik, M. Mozek, B. Pecar, and S. Amon, J. Micromech. Microeng. 21, 025025 (2011). doi 10.1088/0960-1317/21/2/025025
C. V. Thompson, J. Appl. Phys. 58, 763 (1985). doi 10.1063/1.336194
C. C. Wong, H. I. Smith, and C. V. Thompson, Appl. Phys. Lett. 48, 335 (1986). doi 10.1063/1.96543
W. Gruber, C. Baehtz, M. Horisberger, I. Ratschinski, and H. Schmidt, Appl. Surf. Sci. 368, 341 (2016). doi 10.1016/j.apsusc.2016.02.015
F. Ruffino, M. G. Grimaldi, C. Bongiorno, F. Giannazzo, F. Roccaforte, V. Raineri, and C. Spinella, J. Appl. Phys. 105, 054311 (2009). doi 10.1063/1.3093681
S. H. Brongersma, E. Richard, I. Vervoort, H. Bender, W. Vandervorst, S. Lagrange, G. Beyer, and K. Maex, J. Appl. Phys. 86, 3642 (1999). doi 10.1063/1.371272
C. Lingk, M. E. Gross, and W. L. Brown, J. Appl. Phys. 87, 2232 (2000). doi 10.1063/1.372166
Platinum, Its Alloys, and Composite Materails, Ed. by E. V. Vasil’eva (Metallurgiya, Moscow, 1980).
R. Dannenberg, E. A. Stach, J. R. Groza, and B. J. Dresser, Thin Solid Films 370, 54 (2000). doi 10.1016/S0040-6090(99)00947-5
D. Briand, S. Heimgartner, M. Leboeuf, M. Dadras, and N. F. de Rooij, Mater. Res. Soc. Symp. Proc. 729, U2.5 (2002). doi 10.1557/PROC-729-U2.5
C.-L. Dai, F.-Y. Xiao, C.-Y. Lee, Y.-C. Cheng, P.-Z. Chang, and S.-H. Chang, Mater. Sci. Eng., A 384, 57 (2004). doi 10.1016/j.msea.2004.05.067
H. Z. Yu and C. V. Thompson, Acta Mater. 67, 189 (2014). doi 10.1016/j.actamat.2013.12.031
J. H. Jeffries, J.-K. Zuo, and M. M. Craig, Phys. Rev. Lett. 76, 4931 (1996). doi 10.1103/PhysRevLett.76.4931
M. C. Salvadori, L. L. Melo, M. Cattani, O. R. Monteiro, and I. G. Brown, Surf. Rev. Lett. 10, 1 (2003). doi 10.1142/S0218625X03004561
M. C. Salvadori, I. G. Brown, A. R. Vaz, L. L. Melo, and M. Cattani, Phys. Rev. B 67, 153404 (2003). doi 10.1103/PhysRevB.67.153404
Ya. S. Umanskii, Yu. A. Skakov, A. N. Ivanov, and L. N. Rastorguev, Crystallography, X-ray Diffraction, and Electron Microscopy (Metallurgiya, Moscow, 1982).
W. Ruland, J. Appl. Crystallogr. 1, 90 (1968). doi 10.1107/S0021889868005066
F. R. L. Schoening, Acta Crystallogr. 18, 975 (1965). doi 10.1107/S0365110X65002335
Author information
Authors and Affiliations
Corresponding author
Additional information
Original Russian Text © R.V. Selyukov, V.V. Naumov, S.V. Vasilev, 2018, published in Zhurnal Tekhnicheskoi Fiziki, 2018, Vol. 88, No. 6, pp. 926–933.
Rights and permissions
About this article
Cite this article
Selyukov, R.V., Naumov, V.V. & Vasilev, S.V. The Influence of Film Thickness on Annealing-Induced Grain Growth in Pt Films. Tech. Phys. 63, 900–907 (2018). https://doi.org/10.1134/S106378421806018X
Received:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S106378421806018X