Technical Physics

, Volume 59, Issue 10, pp 1545–1549 | Cite as

Deposition of transparent indium tin oxide electrodes by magnetron sputtering of a metallic target on a cold substrate

Physical Electronics

Abstract

Indium tin oxide layers with a surface resistance of 50 Ω/□ and a transmission in the visible range of up to 100% are obtained by magnetron sputtering of a metallic target on a cold substrate without ion enhancement of deposition and subsequent annealing. It is shown that the above parameters of the layers can be achieved in a wide range of oxygen partial pressures by controlling the deposition rate and in a wide range of deposition rates by controlling the oxygen partial pressure. An unambiguous dependence of the deposition rate on the oxygen partial pressure in the chamber is constructed.

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Copyright information

© Pleiades Publishing, Ltd. 2014

Authors and Affiliations

  1. 1.St. Petersburg State University of Information Technologies, Mechanics, and OpticsSt. PetersburgRussia

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