Deposition of transparent indium tin oxide electrodes by magnetron sputtering of a metallic target on a cold substrate
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Indium tin oxide layers with a surface resistance of 50 Ω/□ and a transmission in the visible range of up to 100% are obtained by magnetron sputtering of a metallic target on a cold substrate without ion enhancement of deposition and subsequent annealing. It is shown that the above parameters of the layers can be achieved in a wide range of oxygen partial pressures by controlling the deposition rate and in a wide range of deposition rates by controlling the oxygen partial pressure. An unambiguous dependence of the deposition rate on the oxygen partial pressure in the chamber is constructed.
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