Two modes of laser lithography fabrication of three-dimensional submicrometer structures
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The modes of laser lithography fabrication of three-dimensional submicrometer structures have been studied. The method is based on the effect of threshold two-photon polymerization of a photosensitive material at the laser beam focus. To determine the lithograph workspace in the coordinates “laser power-speed of the sample displacement with respect to the laser focus,” a series of photonic crystals with the woodpile structure is prepared. Two methods for fabricating three-dimensional structures, i.e., raster scanning and vector graphics (or the vector method) are analyzed in detail. The advantages of the vector method for fabricating periodic structures are demonstrated using crystals of inverted yablonovite as an example. The prepared samples are studied by scanning electron microscopy.
KeywordsPhotonic Crystal Micromodel Laser Beam Focus Vector Method Vector Graphic
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