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Semiconductors

, Volume 53, Issue 2, pp 255–259 | Cite as

Effect of the Temperature of Photonic Annealing on the Structural and Optical Properties of ZnO Films Synthesized by Dual Magnetron-Assisted Sputtering

  • S. V. ZaitsevEmail author
  • V. S. Vaschilin
  • V. V. Kolesnik
  • M. V. Limarenko
  • D. S. Prokhorenkov
  • E. I. Evtushenko
FABRICATION, TREATMENT, AND TESTING OF MATERIALS AND STRUCTURES
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Abstract

Zinc-oxide films 1.4 μm in thickness are deposited onto glassy substrates by the dual magnetron-assisted sputtering of zinc targets in an argon and oxygen gas atmosphere. The dependences of the structural and optical characteristics of the ZnO films on the temperature of postdeposition photonic annealing are studied. It is established that an increase in the annealing temperature yields an increase in the degree of crystallinity of the films. Electron microscopy shows that the deposited ZnO coatings are columnar in structure and the microstructure density and crystallite size increase upon annealing. It is found that, at an annealing temperature of 450–650°C, the optical transmittance increases to >90% in the spectral range 400–1100 nm. The experimental results show that the temperature of vacuum photonic annealing has the most profound effect on the final properties of ZnO coatings.

Notes

ACKNOWLEDGMENTS

The study was supported by the Ministry of Education and Science of the Russian Federation, government order no. 11.9329.2017/8.9. The study was carried out using equipment of the Center of Advanced Technologies, Belgorod State Technological University.

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Copyright information

© Pleiades Publishing, Ltd. 2019

Authors and Affiliations

  • S. V. Zaitsev
    • 1
    Email author
  • V. S. Vaschilin
    • 1
  • V. V. Kolesnik
    • 1
  • M. V. Limarenko
    • 1
  • D. S. Prokhorenkov
    • 1
  • E. I. Evtushenko
    • 1
  1. 1.Belgorod State Technological UniversityBelgorodRussia

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