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Semiconductors

, Volume 52, Issue 8, pp 1068–1071 | Cite as

Modulation of the Charge of Germanium MIS Structures with Fluorine-Containing Insulators

  • M. B. Shalimova
Physics of Semiconductor Devices

Abstract

An insulator layer of ErF3, YF3, NdF3, and TmF3 was formed in n-type Ge-based MIS (metal–insulator–semiconductor) structures. It is shown that no negative effective charge is observed in these Ge MIS structures, while the degradation of electric characteristics and the rise of density of surface states leads to an increase in the positive charge. The positive charge formed at the Ge–rare-earth-element fluoride interface can compensate the negative charge of dangling bonds on the surface of Ge, which is potentially promising for modulation of the charge magnitude and sign in MIS devices based on Ge.

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References

  1. 1.
    A. Molle, S. Baldovino, S. Spiga, and M. Fanciulli, Thin Solid Films 518, S96 (2010).ADSCrossRefGoogle Scholar
  2. 2.
    V. C. Henkel, P-E. Hellström, M. Östling, M. Stöger-Pollach, O. Bethge, and E. Bertagnolli, Solid-State Electron. 74, 7 (2012).ADSCrossRefGoogle Scholar
  3. 3.
    L. K. Chu, R. L. Chu, T. D. Lin, W. C. Lee, C. A. Lin, M. L. Huang, Y. J. Lee, J. Kwo, and M. Hong, Solid-State Electron. 54, 965 (2010).ADSCrossRefGoogle Scholar
  4. 4.
    S. N. A. Murad, P. T. Baine, D. W. McNeill, S. J. N. Mitchell, B. M. Armstrong, M. Modreanu, G. Hughes, and R. K. Chellappan, Solid-State Electron. 78, 136 (2012).ADSCrossRefGoogle Scholar
  5. 5.
    S. Mather, N. Sedghi, M. Althobaiti, I. Z. Mitrovic, V. Dhanak, P. R. Chalker, and S. Hall, Microelectron. Eng. 109, 126 (2013).CrossRefGoogle Scholar
  6. 6.
    C. X. Li, C. D. Wanga, C. H. Leung, P. T. Lai, and J. P. Xu, Microelectron. Eng. 86, 1596 (2009).CrossRefGoogle Scholar
  7. 7.
    M. B. Shalimova and E. N. Khavdey, in Germanium: Properties, Production and Applications (Nova Science, New York, 2012), p. 187.Google Scholar
  8. 8.
    M. B. Shalimova and N. V. Sachuk, Semiconductors 49, 1045 (2015).ADSCrossRefGoogle Scholar
  9. 9.
    C. G. van de Walle, M. Choi, J. R. Weber, J. L. Lyons, and A. Janotti, Microelectron. Eng. 109, 211 (2013).CrossRefGoogle Scholar
  10. 10.
    P. Tsipas and A. Dimoulas, Appl. Phys. Lett. 94, 012114 (2009).ADSCrossRefGoogle Scholar

Copyright information

© Pleiades Publishing, Ltd. 2018

Authors and Affiliations

  1. 1.Samara National Research UniversitySamaraRussia

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