, Volume 49, Issue 8, pp 1111–1118 | Cite as

Determination of the technological growth parameters in the InAs-GaAs system for the MOCVD synthesis of “Multimodal” InAs QDs

  • R. A. Salii
  • S. A. Mintairov
  • P. N. Brunkov
  • A. M. Nadtochiy
  • A. S. Payusov
  • N. A. Kalyuzhnyy
Fabrication, Treatment, and Testing of Materials and Structures


The specific features of growth in the InAs-GaAs system by the metal-organic chemical vapor deposition method are studied. The dependences of the In content of the InxGa1 − x As solid solution and of the InAs growth rate on the molar flow of In in a wide temperature range (480–700°C) are determined. The growth processes of InAs quantum dots (QDs) on GaAs with different surface misorientations are examined. The conditions are found in which InAs QDs are formed with a small number of defects and at a high density on a GaAs “sublayer” grown at a high rate. An epitaxial technique is developed for the synthesis of InAs QDs with multimodal size distribution and an extended photoluminescence spectrum, which can be effectively used in designing solar cells with QDs in the active region.


GaAs Metal Organic Chemical Vapor Deposition GaAs Surface Molecular Beam Epit Multimodal Size Distribution 
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Copyright information

© Pleiades Publishing, Ltd. 2015

Authors and Affiliations

  • R. A. Salii
    • 1
  • S. A. Mintairov
    • 1
  • P. N. Brunkov
    • 1
    • 2
    • 3
  • A. M. Nadtochiy
    • 1
    • 4
  • A. S. Payusov
    • 1
    • 2
  • N. A. Kalyuzhnyy
    • 1
  1. 1.Ioffe InstituteRussian Academy of SciencesSt. PetersburgRussia
  2. 2.St. Petersburg Academic University, Nanotechnology Research and Education CentreRussian Academy of SciencesSt. PetersburgRussia
  3. 3.National Research University of Information Technologies, Mechanics and Optics “ITMO”St. PetersburgRussia
  4. 4.“Solar Dots” OOOSt. PetersburgRussia

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