, Volume 46, Issue 11, pp 1460–1470 | Cite as

Light-emitting tunneling nanostructures based on quantum dots in a Si and GaAs matrix

  • V. G. Talalaev
  • A. A. Tonkikh
  • N. D. Zakharov
  • A. V. Senichev
  • J. W. Tomm
  • P. Werner
  • B. V. Novikov
  • L. V. Asryan
  • B. Fuhrmann
  • J. Schilling
  • H. S. Leipner
  • A. D. Bouraulev
  • Yu. B. Samsonenko
  • A. I. Khrebtov
  • I. P. Soshnikov
  • G. E. Cirlin
XVI Symposium “Nanophysics and Nanoelectronics”, Nizhni Novgorod, March 12–16, 2012


InGaAs/GaAs and Ge/Si light-emitting heterostructures with active regions consisting of a system of different-size nanoobjects, i.e., quantum dot layers, quantum wells, and a tunneling barrier are studied. The exchange of carriers preceding their radiative recombination is considered in the context of the tunneling interaction of nanoobjects. For the quantum well-InGaAs quantum dot layer system, an exciton tunneling mechanism is established. In such structures with a barrier thinner than 6 nm, anomalously fast carrier (exciton) transfer from the quantum well is observed. The role of the above-barrier resonance of states, which provides “instantaneous” injection into quantum dots, is considered. In Ge/Si structures, Ge quantum dots with heights comparable to the Ge/Si interface broadening are fabricated. The strong luminescence at a wavelength of 1.55 μm in such structures is explained not only by the high island-array density. The model is based on (i) an increase in the exciton oscillator strength due to the tunnel penetration of electrons into the quantum dot core at low temperatures (T < 60 K) and (ii) a redistribution of electronic states in the Δ24 subbands as the temperature is increased to room temperature. Light-emitting diodes are fabricated based on both types of studied structures. Configuration versions of the active region are tested. It is shown that selective pumping of the injector and the tunnel transfer of “cold” carriers (excitons) are more efficient than their direct trapping by the nanoemitter.


Quantum Well Transmission Electron Micro Barrier Thickness Tunneling Time Transmission Electron Micro Image 


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Copyright information

© Pleiades Publishing, Ltd. 2012

Authors and Affiliations

  • V. G. Talalaev
    • 1
    • 4
  • A. A. Tonkikh
    • 1
  • N. D. Zakharov
    • 1
  • A. V. Senichev
    • 1
    • 3
  • J. W. Tomm
    • 2
  • P. Werner
    • 1
  • B. V. Novikov
    • 3
  • L. V. Asryan
    • 6
  • B. Fuhrmann
    • 5
  • J. Schilling
    • 4
    • 5
  • H. S. Leipner
    • 4
    • 5
  • A. D. Bouraulev
    • 7
    • 8
  • Yu. B. Samsonenko
    • 7
    • 9
  • A. I. Khrebtov
    • 7
  • I. P. Soshnikov
    • 7
    • 8
  • G. E. Cirlin
    • 7
    • 9
  1. 1.Max-Planck-Institut für MikrostrukturphysikHalle (Saale)Germany
  2. 2.Max-Born-Institut für Nichtlineare Optik und KurzzeitspektroskopieBerlinGermany
  3. 3.Fock Institute of PhysicsSt. Petersburg State UniversityPetrodvorets, St. PetersburgRussia
  4. 4.Martin-Luther-Universität Halle-WittenbergHalleGermany
  5. 5.Martin-Luther-Universität, IZMHalleGermany
  6. 6.Virginia Polytechnic Institute and State UniversityBlacksburgUSA
  7. 7.Russian Academy of SciencesSt. Petersburg Academic University, Nanotechnology Research and Education CentreSt. PetersburgRussia
  8. 8.Ioffe Physical-Technical InstituteRussian Academy of SciencesSt. PetersburgRussia
  9. 9.Institute for Analytical InstrumentationRussian Academy of SciencesSt. PetersburgRussia

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