, Volume 46, Issue 3, pp 410–413 | Cite as

Pulsed laser deposition of ITO thin films and their characteristics

  • D. A. ZuevEmail author
  • A. A. Lotin
  • O. A. Novodvorsky
  • F. V. Lebedev
  • O. D. Khramova
  • I. A. Petuhov
  • Ph. N. Putilin
  • A. N. Shatohin
  • M. N. Rumyanzeva
  • A. M. Gaskov
Fabrication, Treatment, and Testing of Materials and Structures


The indium tin oxide (ITO) thin films are grown on quartz glass substrates by the pulsed laser deposition method. The structural, electrical, and optical properties of ITO films are studied as a function of the substrate temperature, the oxygen pressure in the vacuum chamber, and the Sn concentration in the target. The transmittance of grown ITO films in the visible spectral region exceeds 85%. The minimum value of resistivity 1.79 × 10−4 Ω cm has been achieved in the ITO films with content of Sn 5 at %.


Substrate Temperature Thin Solid Film Pulse Laser Deposition Visible Spectral Region Pulse Laser Deposition Method 
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Copyright information

© Pleiades Publishing, Ltd. 2012

Authors and Affiliations

  • D. A. Zuev
    • 1
    Email author
  • A. A. Lotin
    • 1
  • O. A. Novodvorsky
    • 1
  • F. V. Lebedev
    • 1
  • O. D. Khramova
    • 1
  • I. A. Petuhov
    • 2
  • Ph. N. Putilin
    • 2
  • A. N. Shatohin
    • 2
  • M. N. Rumyanzeva
    • 2
  • A. M. Gaskov
    • 2
  1. 1.Institute on Laser and Information TechnologiesRussian Academy of SciencesShatura, Moscow oblastRussia
  2. 2.Faculty of ChemistryMoscow State UniversityMoscowRussia

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