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Transformation of the Spectra of a Attenuated Total Reflection when Drying a Diazoquinone-Novolach Photoresist

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Abstract

The Fourier transform infrared spectroscopy of the attenuated total reflection (ATR), solutions and films of a positive diazoquinone-novolac (DN) FP9120 photoresist (PR) are investigated. The bands at 966, 1110, 1240, and 1735 cm–1, caused by the absorption of the solvent 1-methoxy-2-propyl acetate (MPA), are dominant in the ATR spectra of the PR solution. The solvent is completely removed from the 1.0–5.0-μm-thick PR films during drying at temperatures of ~90°C for 1 hour. It is preferable to detect the residual solvent in solid PR films using the 966 cm–1 band. The intensity of the vibrations related to aromatic rings (bands in the range 1510–1610 cm–1) increases after drying. The band at 1452 cm–1 is due to the valent vibrations related to the CH2 bridge between the aromatic rings of phenol-formaldehyde resin and after drying it splits into 2 bands.

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ACKNOWLEDGMENTS

The authors thank E.V. Grinyuk for his help in measuring the ATR spectra.

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Correspondence to S. D. Brinkevich or A. N. Petlitsky.

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Brinkevich, D.I., Brinkevich, S.D., Petlitsky, A.N. et al. Transformation of the Spectra of a Attenuated Total Reflection when Drying a Diazoquinone-Novolach Photoresist. Russ Microelectron 50, 239–245 (2021). https://doi.org/10.1134/S106373972104003X

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  • DOI: https://doi.org/10.1134/S106373972104003X

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