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Russian Metallurgy (Metally)

, Volume 2018, Issue 8, pp 763–766 | Cite as

Formation of an Electrode Deposit under Galvanostatic Conditions

  • V. A. IsaevEmail author
  • O. V. Grishenkova
  • M. V. Laptev
  • A. V. Isakov
  • Yu. P. Zaikov
Article
  • 10 Downloads

Abstract

The laws of formation of a continuous deposit layer at a given direct current are considered. Equations are analyzed to calculate the time dependences of overpotential for instantaneous nucleation with kinetic or diffusion control of new-phase growth. The calculated dependences are compared with the experimental ones obtained for silicon electrodeposition from a fluoride–chloride melt.

Keywords: electrocrystallization galvanostatic method nucleation growth continuous layer melt 

Notes

ACKNOWLEDGMENTS

This work was supported by the Russian Science Foundation, project no. 16-13-00061.

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Copyright information

© Pleiades Publishing, Ltd. 2018

Authors and Affiliations

  • V. A. Isaev
    • 1
    Email author
  • O. V. Grishenkova
    • 1
  • M. V. Laptev
    • 1
  • A. V. Isakov
    • 1
  • Yu. P. Zaikov
    • 1
  1. 1.Institute of High-Temperature Electrochemistry, Ural Branch, Russian Academy of SciencesYekaterinburgRussia

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