Advertisement

Optics and Spectroscopy

, Volume 125, Issue 1, pp 65–73 | Cite as

The Effect of Short-Wave UV Radiation in Recording Holographic Structures on Gelatin-Containing Recording Media (Overview)

  • N. M. GanzherliEmail author
  • S. N. Gulyaev
  • I. A. Maurer
Holography
  • 15 Downloads

Abstract

The review discusses the possibility of obtaining highly effective relief-phase structures on silver halide photographic emulsions and dichromated gelatin layers by irradiating initially recorded holographic structures with short-wave UV radiation.

Preview

Unable to display preview. Download preview PDF.

Unable to display preview. Download preview PDF.

References

  1. 1.
    S. N. Gulyaev and V. P. Ratushnyi, J. Opt. Technol. 70, 105 (2003). doi 10.1364/JOT.70.000105ADSCrossRefGoogle Scholar
  2. 2.
    S. N. Gulyaev and I. V. Isaev, Proc. SPIE 4348, 59 (2001).ADSCrossRefGoogle Scholar
  3. 3.
    V. A. Barachevsky, Opt. Spectrosc. 124, 373 (2018). doi 10.21883/OS.2018.03.45659.238-17ADSCrossRefGoogle Scholar
  4. 4.
    C. Neipp, I. Pascual, and A. Beléndez, Appl. Opt. 41, 4092 (2002).ADSCrossRefGoogle Scholar
  5. 5.
    M. Ulibarrena, L. Carretero, R. Madrigal, S. Blaya, and A. Fimia, Opt. Express 11, 3385 (2003).ADSCrossRefGoogle Scholar
  6. 6.
    I. Bányász, Opt. Commum. 225, 269 (2003).ADSCrossRefGoogle Scholar
  7. 7.
    I. Bányász, Appl. Phys. Lett. 83, 4282 (2003).ADSCrossRefGoogle Scholar
  8. 8.
    S. V. Lim, D. V. Choy, and S. Kh. Son, J. Opt. Technol. 71, 26 (2004).ADSCrossRefGoogle Scholar
  9. 9.
    J. M. Kim, B. S. Choi, S. I. Kim, J. M. Kim, H. I. Bjelkhagen, and N. J. Phillips, Appl. Opt. 40, 622 (2001).ADSCrossRefGoogle Scholar
  10. 10.
    J. M. Kim, B. S. Choi, Y. S. Choi, J. M. Kim, H. I. Bjelkhagen, and N. J. Phillips, Appl. Opt. 41, 1522 (2002).ADSCrossRefGoogle Scholar
  11. 11.
    Yu. E. Usanov and M. K. Shevtsov, Opt. Spectrosc. 69, 112 (1990).ADSGoogle Scholar
  12. 12.
    Yu. E. Usanov, M. K. Shevtsov, N. L. Kosobokova, and E. A. Kirienko, Opt. Spectrosc. 71, 375 (1991).ADSGoogle Scholar
  13. 13.
    C. Neipp, A. Márquez, I. Pascual, and A. Beléndez, J. Opt. A: Pure Appl. Opt. 5, S183 (2003).CrossRefGoogle Scholar
  14. 14.
    H. M. Smith, J. Opt. Soc. Am. 58, 533 (1968).ADSCrossRefGoogle Scholar
  15. 15.
    E. B. Brui and S. N. Koreshev, Opt. Spectrosc. 67, 403 (1989).ADSGoogle Scholar
  16. 16.
    A. D. Gal’pern, I. V. Kalinina, L. V. Selyavko, and V. P. Smaev, Opt. Spectrosc. 60, 644 (1986).ADSGoogle Scholar
  17. 17.
    F. N. Ecevit, A. Alaçakir, and R. Aydin, Appl. Opt. 35, 6227 (1996).ADSCrossRefGoogle Scholar
  18. 18.
    E. Navarrete-Garcia and S. Calixto, Opt. Mater. 23, 501 (2003).ADSCrossRefGoogle Scholar
  19. 19.
    M. M. Butusov and A. I. Ioffe, Sov. J. Quantum Electron. 6, 519 (1976).ADSCrossRefGoogle Scholar
  20. 20.
    S. N. Gulyaev, Cand. Sci. (Phys. Math.) Dissertation (SPb State Polytech. Univ., St. Petersburg, 2005).Google Scholar
  21. 21.
    N. M. Ganzherl, Y. N. Denisyuk, I. A. Maurer, and D. F. Chernykh, Tech. Phys. 50, 274 (2005). doi 10.1134/1.1866449CrossRefGoogle Scholar
  22. 22.
    N. M. Ganzherli and S. N. Gulyaev, J. Opt. Technol. 74, 622 (2007). doi 10.1364/JOT.74.000622CrossRefGoogle Scholar
  23. 23.
    N. M. Ganzherli, S. N. Gulyaev, and I. A. Maurer, High Energy Chem. 42, 540 (2008). doi 10.1134/ S0018143908070114CrossRefGoogle Scholar
  24. 24.
    N. M. Ganzherli, S. N. Gulyaev, A. S. Gurin, D. D. Kramushchenko, I. A. Maurer, and D. F. Chernykh, Tech. Phys. 54, 1002 (2009). doi 10.1134/ S1063784209070123CrossRefGoogle Scholar
  25. 25.
    N. M. Ganzherli, S. N. Gulyaev, I. A. Maurer, and D. F. Chernykh, Proc. SPIE 7358, 735817 (2009).CrossRefGoogle Scholar
  26. 26.
    E. O’Neil, Introduction to Statistical Optics, Dover Books on Physics (Dover, New York, 2004; Mir, Moscow, 1966).Google Scholar
  27. 27.
    N. M. Ganzherli, S. N. Gulyaev, I. A. Maurer, and D. F. Chernykh, Mir Golografii 1 (1), 35 (2013). https://doi.org/www.holography-journal.com/wp-content/themes/eCommerce/Files/W_H_vol1_N1.pdf.Google Scholar
  28. 28.
    N. M. Ganzherli, S. N. Gulyaev, I. A. Maurer, and D. F. Chernykh, Tech. Phys. 59, 1849 (2014).CrossRefGoogle Scholar
  29. 29.
    N. M. Ganzherli, S. N. Gulyaev, I. A. Maurer, and D. F. Chernykh, J. Opt. Technol. 82, 158 (2015).CrossRefGoogle Scholar
  30. 30.
    N. M. Ganzherli, S. N. Gulyaev, A. S. Gurin, D. D. Kramushchenko, I. A. Maurer, and D. F. Chernykh, J. Opt. Technol. 76, 388 (2009). doi 10.1364/ JOT.76.000388CrossRefGoogle Scholar
  31. 31.
    N. M. Ganzherli, S. N. Gulyaev, I. A. Maurer, G. Yu. Sotnikova, and D. F. Chernykh, Proc. SPIE 8074, 80740T-1 (2011).Google Scholar
  32. 32.
    S. N. Gulyaev, I. A. Maurer, D. F. Chernykh, and S. A. Yalovik, Tech. Phys. 57, 1230 (2012). doi 10.1134/ S1063784212090101CrossRefGoogle Scholar
  33. 33.
    K. S. Pennington, J. S. Harper, and F. P. Laming, Appl. Phys. Lett. 18, 80 (1971).ADSCrossRefGoogle Scholar
  34. 34.
    T. A. Shankoff, Appl. Opt. 7, 2101 (1968). doi 10.1364/ AO.7.002101ADSCrossRefGoogle Scholar
  35. 35.
    O. N. Kozakov and S. A. Kulipanov, Zh. Nauchn. Prikl. Fotogr. Kinematogr. 39 (1), 17 (1994).Google Scholar
  36. 36.
    N. M. Ganzherli, S. N. Gulyaev, and I. A. Maurer, Tech. Phys. Lett. 42, 988 (2016). doi 10.1134/ S1063785016100060ADSCrossRefGoogle Scholar
  37. 37.
    N. M. Ganzherli, S. N. Gulyaev, and I. A. Maurer, J. Opt. Technol. 84, 617 (2017). doi 10.1364/ JOT.84.000617CrossRefGoogle Scholar
  38. 38.
    N. M. Ganzherli, S. N. Gulyaev, I. A. Maurer, and D. R. Khazvalieva, Opt. Spectrosc. 124, 408 (2018). doi 10.21883/OS.2018.03.45660.246-17ADSCrossRefGoogle Scholar
  39. 39.
    M. A. McCord and M. J. Rooks, in Handbook of Microlithography, Micromachining and Microfabrication, Ed. by P. Rai-Choudhury, Vol. 1: Microlithography (SPIE Opt. Eng. Press, Bellingham, Washington, 1997), Chap. 2, p. 139. doi 10.1117/3.2265070Google Scholar
  40. 40.
    W. M. Moreau, Semiconductor Lithography Principles: Practices and Materials (Plenum, New York, 1988).CrossRefGoogle Scholar
  41. 41.
    M. Haiducu, M. Rahbar, I. G. Foulds, R. W. Johnstone, D. Sameoto, and M. Parameswaran, J. Micromech. Microeng. 18, 115029 (2008). doi 10.1088/0960- 1317/18/11/115029ADSCrossRefGoogle Scholar
  42. 42.
    R. W. Johnstone, I. G. Foulds, and M. Parameswaran, J. Vac. Sci. Technol. B 26, 682 (2008). doi 10.1116/ 1.2890688CrossRefGoogle Scholar
  43. 43.
    S. N. Gulyaev, in Proceedings of the All-Russia Seminar on Yu.N. Denisyuk Is the Founder of National Holography, St. Petersburg, May 22–24, 2007, p. 168. https://doi.org/www.ioffe.ru/loeg/denisyuk_seminar.html.Google Scholar
  44. 44.
    M. J. Rooks, E. Kratschmer, R. Viswanathan, J. Katine, R. E. Fontana, Jr., and S. A. MacDonald, J. Vacuum Sci. Technol. B 20, 2937 (2002). doi 10.1116/1.1524971CrossRefGoogle Scholar
  45. 45.
    C. F. Hoole, M. E. Welland, and A. N. Broers, Semicond. Sci. Technol. 12, 1166 (1997). doi 10.1088/0268-1242/12/9/017ADSCrossRefGoogle Scholar

Copyright information

© Pleiades Publishing, Ltd. 2018

Authors and Affiliations

  • N. M. Ganzherli
    • 1
    Email author
  • S. N. Gulyaev
    • 2
  • I. A. Maurer
    • 1
  1. 1.Ioffe InstituteSt. PetersburgRussia
  2. 2.Peter the Great St. Petersburg Polytechnic UniversitySt. PetersburgRussia

Personalised recommendations