Optical properties of the HfO2 − xNx and TiO2 − xNx films prepared by ion beam sputtering
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- Atuchin, V.V., Kruchinin, V.N., Kalinkin, A.V. et al. Opt. Spectrosc. (2009) 106: 72. doi:10.1134/S0030400X09010093
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Optical characteristics of the HfO2 − xNx and TiO2 − xNx films obtained by reactive ion beam sputtering have been investigated by spectral ellipsometry. The chemical composition of the films was determined using X-ray photoelectron spectroscopy. The nitrogen content in the oxynitride films (determined by the N2/O2 ratio in the gas mixture during synthesis) reached ≈9 at % for TiO2 − xNx and ≈ 6 at % for HfO2 − xNx. It is found that the dispersion relations n(λ) and k(λ) for the TiO2 − xNx films change from those characteristic of titanium dioxide to those typical of titanium nitride with an increase in the nitrogen content from 0 to ≈9 at %. The optical parameters of the HfO2 − xNx films depend weakly on the nitrogen content in the range 0–6 at %.