Advertisement

High Energy Chemistry

, Volume 53, Issue 5, pp 413–417 | Cite as

Photopolymerization of Thick Layers of Compositions for Mask-Based Stereolithographic Synthesis

  • S. A. ChesnokovEmail author
  • Yu. V. Chechet
  • V. V. Yudin
  • G. A. Abakumov
TECHNOLOGY ASPECTS
  • 18 Downloads

Abstract

The influence of the conditions of mask-based photopolymerization of thick layers of a composition (with thickness h from 0.5 to 4.0 mm) based on dimethacrylate OCM-2 and o-quinone photoinitiator on the geometry of the resulting polymer sample has been studied. Upon photopolymerization of layers through a slit aperture of width l, the polymer formed has a cross section of trapezoid, the large base of which faces to the side of illumination. With increasing exposure, the difference in the sizes of the bases of the trapezoid decreases, which reduces roughness of an object composed of such layers. For stereolithographic synthesis of a 3D model from layers with h = 0.5 and 1.0 mm and roughness of 10 μm, the minimum slit width is achieved at l ≈ 2h.

Keywords:

photopolymerization mask-based stereolithography 3D model roughness dimethacrylate 

Notes

ACKNOWLEDGMENTS

The study was performed on the equipment of the Analytical Center of the G.A. Razuvaev Institute of Organometallic Chemistry of Russian Academy of Sciences.

FUNDING

This work was supported by the Russian Science Foundation, grant no. 18-13-00434.

REFERENCES

  1. 1.
    Melchels, F.P.W., Feijen, J., and Grijpma, D.W., Biomaterials, 2010, vol. 31, no. 24, p. 6121.CrossRefPubMedGoogle Scholar
  2. 2.
    Wang, X., Jiang, M., Zhou, Z., Gou, J., and Hui, D., Compos., Part B: Eng., 2017, vol. 110, p. 442.CrossRefGoogle Scholar
  3. 3.
    Wang, J., Goyanes, A., Gaisford, S., and Basit, A.W., Int. J. Pharm., 2016, vol. 503, no. 1, p. 207.CrossRefPubMedGoogle Scholar
  4. 4.
    Short, D.B., 3D Print. Additive Manufact., 2015, vol. 2, no. 4, p. 209.CrossRefGoogle Scholar
  5. 5.
    Van Bochove, B., Hannink, G., Buma, P., and Grijpma, D.W., Macromol. Biosci., 2016, vol. 16, no. 12, p. 1853.CrossRefPubMedGoogle Scholar
  6. 6.
    Lin, H., Zhang, D., Alexander, P.G., Yang, G., Tan, J., Cheng, A.W.-M., and Tuan, R.S., Biomaterials, 2013, vol. 34, no. 2, p. 331.CrossRefPubMedGoogle Scholar
  7. 7.
    Ali, Z., Türeyen, E.B., Karpat, Y., and Çakmakcı, M., Procedia CIRP, 2016, vol. 42, p. 87.CrossRefGoogle Scholar
  8. 8.
    Borrello, J., Nasser, P., Iatridis, J.C., and Costa, K.D., Additive Manufact., 2018, vol. 23, p. 374.CrossRefGoogle Scholar
  9. 9.
    Hull, C.W., US Patent 4575330, 1986.Google Scholar
  10. 10.
    Chesnokov, S.A., Treushnikov, V.M., Chechet, Yu.V., Cherkasov, V.K., and Mamysheva, O.N., Polym. Sci., Ser. A., 2008, vol. 50, no. 3, p. 291.CrossRefGoogle Scholar
  11. 11.
    Chesnokov, S.A., Lenshina, N.A., Arsenyev, M.V., Kovylin, R.S., Baten’kin, M.A., Poddel’sky, A.I., and Abakumov, G.A., Appl. Organomet. Chem., 2017, vol. 31, no. 2, p. e3553.CrossRefGoogle Scholar
  12. 12.
    Len’shina, N.A., Zakharina, M.Yu., Kovylin, R.S., Baten’kin, M.A., Kulikova, T.I., Arsen’ev, M.V., and Chesnokov, S.A., High Energy Chem., 2018, vol. 52, no. 5, p. 378.CrossRefGoogle Scholar

Copyright information

© Pleiades Publishing, Ltd. 2019

Authors and Affiliations

  • S. A. Chesnokov
    • 1
    Email author
  • Yu. V. Chechet
    • 1
  • V. V. Yudin
    • 1
  • G. A. Abakumov
    • 1
  1. 1.Razuvaev Institute of Organometallic Chemistry, Russian Academy of SciencesNizhny NovgorodRussia

Personalised recommendations