Fabrication of semiconductor-and polymer-based photonic crystals using nanoimprint lithography
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The technology of fabricating photonic crystals with the use of nanoimprint lithography is described. One-and two-dimensional photonic crystals are produced by direct extrusion of polymethyl methacrylate by Si moulds obtained via interference lithography and reactive ion etching. The period of 2D photonic crystals, which present a square array of holes, ranges from 270 to 700 nm; the aperture diameter amounts to the half-period of the structure. The holes are round-shaped with even edges. One-dimensional GaAs-based photonic crystals are fabricated by reactive ion etching of GaAs to a depth of 1 μm through a mask formed using nanoimprint lithography. The resulting crystals have a period of 800 nm, a ridge width of 200 nm, and smooth nearly vertical side walls.
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- 3.M. Bayindir, E. Ozbay, B. Temelkuran, et al., Phys. Rev. B 63, 81107 (2001).Google Scholar
- 7.C. M. Sotomayor Torres, S. Zankovych, J. Seekamp, et al., Mater. Sci. Eng. 23, 23 (2003).Google Scholar
- 8.R. J. Shul and S. J. Pearton, Handbook of Advanced Plasma Processing Techniques (Springer, Berlin, 2000).Google Scholar