Skip to main content
SpringerLink
Log in

Sensitive photoresists for high-speed two­-photon lithography

  • Research Briefing
  • Published:

From Nature Nanotechnology

View current issue Submit your manuscript

Two-photon lithography has advantages for precise additive manufacturing at the nanoscale, but its printing speed is currently too slow for large-scale practical applications. A sensitive photoresist based on zirconium oxide hybrid nanoparticles is shown to increase the linear printing speed of two-­photon lithography up to the order of metres per second.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Fig. 1: Two-photon lithography using ZrO2– BTMST photoresists.

References

  1. Geng, Q., Wang, D., Chen, P. & Chen, S. C. Ultrafast multi-focus 3-D nano-fabrication based on two-photon polymerization. Nat. Commun. 10, 2179 (2019). This paper reports a laser nanofabrication process based on two-photon polymerization and an ultrafast random-access digital micromirror device scanner.

    Article  Google Scholar 

  2. Arnoux, C. et al. Polymerization photoinitiators with near-resonance enhanced two-photon absorption cross-section: toward high-resolution photoresist with improved sensitivity. Macromolecules 53, 9264–9278 (2020). This paper reports highly efficient two-photon initiators and photoresists.

    Article  CAS  Google Scholar 

  3. Li, L. et al. Extreme ultraviolet resist materials for sub-7 nm patterning. Chem. Soc. Rev. 46, 4855–4866 (2017). A review article that presents advances in metal oxide nanoparticle-based photoresists.

    Article  CAS  Google Scholar 

  4. Hahn, V. et al. Rapid assembly of small materials building blocks (voxels) into large functional 3D metamaterials. Adv. Func. Mater. 30, 1907795 (2020). This paper reports a parallel two-photon printing process with a diffractive optical element for splitting the beam into nine beamlets.

    Article  CAS  Google Scholar 

Download references

Additional information

Publisher’s note Springer Nature remains neutral with regard to jurisdictional claims in published maps and institutional affiliations.

This is a summary of: Liu, T. et al. Ultrahigh-printing-speed photoresists for additive manufacturing. Nat. Nanotechnol. https://doi.org/10.1038/s41565-023-01517-w (2023).

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Sensitive photoresists for high-speed two­-photon lithography. Nat. Nanotechnol. 19, 11–12 (2024). https://doi.org/10.1038/s41565-023-01518-9

Download citation

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1038/s41565-023-01518-9

  • Springer Nature Limited

Search

Navigation