Abstract
THE preparation of various metals and metallic alloys in a non-crystalline state using splat cooling, vapour quenching or electrochemical deposition techniques has been reported by many authors. A distinguishing characteristic of such amorphous films is a severe modification of the structure factor from that of the crystalline state. Although usually formed only at low temperatures the non-crystalline state may in some cases be metastable to above room temperature, this being particularly true for alloys near the eutectic. We examine here evidence for metastable non-crystalline alloys resulting from ion irradiation.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
Stephens, G. A., Robinson, E., and Williams, J. S., Ion Implantation in Semiconductors and Other Materials, 375 (Plenum, New York, 1975).
Wang, R., and Merz, M. D., Nature, 260, 35–36 (1976).
Davies, L. B., and Grundy, P. J., Phys. Stat. Sol., 8(a), 189–197 (1971).
Nagel, S. R., and Tauc, J., Phys. Rev. Lett., 35, 380–383 (1975).
Cullis, A. G., Poate, J. M., and Borders, J. A., Appl. Phys. Lett., 28, 314–316 (1976).
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
ANDREW, R., GRANT, W., GRUNDY, P. et al. Non-crystallinity of ion-irradiated metals. Nature 262, 380–381 (1976). https://doi.org/10.1038/262380a0
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1038/262380a0
- Springer Nature Limited
This article is cited by
-
Amorphization of metals by ion implantation and ion mixing methods
Russian Physics Journal (1994)
-
Metastable phase formation in particle-bombarded metallic systems
La Rivista del Nuovo Cimento (1992)
-
Lattice location of lead implanted into silicon at room temperature
Applied Physics (1977)