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Composition and Structure of Films Formed in Etching of Nickel in a Ni(NO3)2 Solution with NiCl2 and NaNO2 Additives

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Abstract

The composition and structure of films formed in etching of nickel in a Ni(NO3)2 solution in the presence of Cl- and NO2 - ions was studied.

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Authors and Affiliations

  1. Nizhni Novgorod State Technical University, Nizhni Novgorod, Russia

    A. A. Bachaev, T. E. Kuzina & L. A. Oshurina

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  1. A. A. Bachaev
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  2. T. E. Kuzina
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  3. L. A. Oshurina
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Bachaev, A.A., Kuzina, T.E. & Oshurina, L.A. Composition and Structure of Films Formed in Etching of Nickel in a Ni(NO3)2 Solution with NiCl2 and NaNO2 Additives. Russian Journal of Applied Chemistry 77, 934–937 (2004). https://doi.org/10.1023/B:RJAC.0000044119.07389.3b

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  • DOI: https://doi.org/10.1023/B:RJAC.0000044119.07389.3b

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