Abstract
The effect of impurities on the formation of the inner porous layer in the Cu2O scale during copper oxidation was examined using 99.99 (4N), 99.9999% (6N) and floating-zone-refined (FZR, >99.9999) copper specimens at 800° C. Oxidation for 240 min shows that an inner porous layer was formed in the Cu2O scale near the Cu2O/Cu interface for 4N copper, but not for 6N and FZR copper. The results support that the inner porous layer in the oxide scale is related to impurities from the metal base.
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Zhu, Y., Mimura, K. & Isshiki, M. The Effect of Impurities on the Formation of the Inner Porous Layer in the Cu2O Scale During Copper Oxidation. Oxidation of Metals 61, 293–301 (2004). https://doi.org/10.1023/B:OXID.0000025336.56015.a2
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DOI: https://doi.org/10.1023/B:OXID.0000025336.56015.a2