References
H. Amano, N. Sawaki, I. Akasaki and Y. Toyoda, Appl. Phys. Lett. 48 (1986) 353.
I. Akasaki, H. Amano, Y. Koide, K. Hiramatsu and N. Sawaki, J. Cryst. Growth 98 (1989) 209.
S. Nakamura, Jpn. J. Appl. Phys. Part 1 30 (1991) L1705.
B. Santic, C. Merz, U. Kaufmann, R. Niebuhr, H. Obloh and K. Bachem, Appl. Phys. Lett. 71 (1997) 1837.
J. Fisher, W. Shan, J. J. Song, Y. C. Chang, R. Horning and B. Goldenberg, ibid. 71 (1997) 1981.
S. Nakamura, Science 281 (1998) 956.
Y. Chen, R. Schneider, S. Y. Wang, R. S. Kern, C. H. Chen and C. P. Kuo, ibid. 75 (1999) 2062.
P. Ramvall, Y. Aoyagi, A. Kuramata, P. Hacke, K. Domen and K. Horino, ibid. 76 (2000) 2994.
F. Ren, M. Hong, S. N. G. Chu, M. A. Marcus, M. J. Schurman and A. Baca, ibid. 73 (1998) 3893.
M. S. Shur, A. D. Bykhovski, R. Gaska, M. A. Khan and J. W. Yang, ibid. 76 (2000) 3298.
S. M. Sze, “VLSI Technology” (McGraw-Hill, New York; 1988).
H. M. Janus and O. M. Marmros, IEEE Trans. Electron Devices 23 (1976) 797.
J. M. Meese (ed.), in Proc. 2nd Internat. Conf. Transmutation Doping in Semiconductors, Missouri, 1979 (Plenum Press, New York, 1979).
J. Guldbug (ed.), in Proc. 3rd Internat. Conf. Transmutation Doping of Silicon, Copenhagen, 1980 (Plenum Press, New York, 1981).
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Park, S.H., Kang, T.W. & Kim, T.W. Effect of annealing on neutron-transmutation-doped GaN epilayers grown on sapphire substrates. Journal of Materials Science 39, 3217–3219 (2004). https://doi.org/10.1023/B:JMSC.0000025864.93045.5f
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DOI: https://doi.org/10.1023/B:JMSC.0000025864.93045.5f