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Formation of C54 TiSi2 thin films by using high-temperature sputtering and rapid thermal annealing

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Authors and Affiliations

  1. Department of Semiconductor Science, Dongguk University, 3-26 Pildong, Chungku, cSeoul, 100-715, Korea

    S. J. Lee & D. Y. Kim

  2. Advanced Semiconductor Research Center, Division of Electrical and Computer Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul, 133-791, Korea

    T. W. Kim

Authors
  1. S. J. Lee
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  2. D. Y. Kim
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  3. T. W. Kim
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Lee, S.J., Kim, D.Y. & Kim, T.W. Formation of C54 TiSi2 thin films by using high-temperature sputtering and rapid thermal annealing. Journal of Materials Science 39, 3203–3205 (2004). https://doi.org/10.1023/B:JMSC.0000025860.31547.e5

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  • DOI: https://doi.org/10.1023/B:JMSC.0000025860.31547.e5

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