Abstract
Thin layers of Te-doped indium antimonide are produced on Al2O3 substrates by directional solidification. The effective distribution coefficient of Te is determined, and the electrical properties (resistivity, carrier mobility, and carrier concentration) of the layers are studied in the range 77–300 K. The mechanisms of carrier scattering governing the electrical properties of the layers are discussed.
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Pashkova, O.N., Padalko, A.G. & Steblevskii, A.V. Preparation and Properties of Thin InSb〈Te〉 Layers on Al2O3 . Inorganic Materials 40, 897–900 (2004). https://doi.org/10.1023/B:INMA.0000041316.95257.f9
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DOI: https://doi.org/10.1023/B:INMA.0000041316.95257.f9