Abstract
The parameters of a helicon plasma source was studied for an rf power to 500 W and a magnetic field ranging from 0 to 200 G under an argon pressure of 3 mtorr. The electron density in the plasma was found to reach 1012 cm–3. Axial and radial electron distributions were studied. Helicon waves were excited by antennas of three types, a loop antenna being the most efficient. It is shown that the electron density in the plasma can significantly be increased if the system is under a nonuniform magnetic field such that its lower-value (relative to the rest of the system) part is applied to the antenna.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
REFERENCES
Keller, J.H., Inductive Plasmas for Plasma Processing, Plasma Sources Sci. Technol., 1996, vol. 5, pp. 166–172.
Keller, J.H., New and Possible Future Trends in Inductively Coupled Plasmas for Semiconductor Processing, Plasma Phys. Controlled Fusion, 1997, vol. 39, pp. A437–A443.
Gudmundsson, J.T., Kimura, T., and Lieberman, M.A., Experimental Studies of O2/Ar Plasma in a Planar Inductive Discharge, Plasma Sources Sci. Technol., 1999, vol 8, pp. 22–30.
Sugai, H., Ghanashev, I., and Nagatsu, M., High-Density Flat Plasma Production Based on Surface Waves, Plasma Sources Sci. Technol., 1998, vol. 7, pp. 192–205.
Asmussen, J., Jr., Grotjohn, T.A., Mak, P., and Perrin, M.A., The Design and Application of Electron Cyclotron Resonance Discharges, IEEE Trans. Plasma Sci., 1997, vol. 25, pp. 1196–1222.
Tepermeister, I., Blayo, N., Klemens, F.P., Ibbotson, D.E., Gottscho, R.A., Lee, J.T.C., and Sawin, H.H., Comparison of Advanced Plasma Sources for Etching Applications. I. Etching Rate, Uniformity, and Profile Control in a Helicon and Multiple Electron Cyclotron Resonance Source, J. Vac. Sci. Technol., B, 1994, vol.12, pp. 2310–2321.
Tepermeister, I., Ibbotson, D.E., Lee, J.T.C., and Sawin, H.H., Comparison of Advanced Plasma Sources for Etching Applications. II. Langmuir Probe Studies of a Helicon and Multiple Electron Cyclotron Resonance Source, J. Vac. Sci. Technol., B, 1994, vol. 12, pp. 2322–2332.
Gibson, G.W. and Sawin, H.H., Comparison of Advanced Plasma Sources for Etching Applications. III. Ion Energy Distribution Functions for a Helicon and Multiple Electron Cyclotron Resonance Source, J. Vac. Sci. Technol., B, 1994, vol. 12, pp. 2333–2341.
Boswell, R.W. and Chen, F.F., Helicons—the Early Years, IEEE Trans. Plasma Sci., 1997, vol. 25, pp. 1229–1244.
Boswell, R.W. and Chen, F.F., Helicons—the Past Decade, IEEE Trans. Plasma Sci., 1997, vol. 25, pp.1245–1257.
Lho, T., Hershkowitz, N., Miller, J., Steer, W., and Kim, G.H., Azimuthally Symmetric Pseudosurface and Helicon Wave Propagation in an Inductively Coupled Plasma at Low Magnetic Field, Phys. Plasmas, 1998, vol. 5, pp. 3135–3142.
Rayner, J.P. and Cheetham, A.D., Helicon Modes in a Cylindrical Plasma Source, Plasma Sources Sci. Technol.,1999, vol. 8, pp. 79–87.
Chi, K.K., Sheridan, T.E., and Boswell, R.W., Resonant Cavity Modes of a Bounded Helicon Discharge, Plasma Sources Sci. Technol., 1999, vol. 8, pp. 421–431.
Carter, C. and Khachan, J., Downstream Plasma Characteristics From a Single Loop Antenna in a Helicon Processing Reactor, Plasma Sources Sci. Technol., 1999, vol. 8, pp. 432–439.
Braginskii, O.V., Vasil'eva, A.N., and Kovalev, A.S., Characteristics of Plasma Excited by Helicon Waves, Fiz. Plazmy, 1998, vol. 24, pp. 821–826.
Perry, A.J., Vender, D., and Boswell, R.W., The Application of the Helicon Source to Plasma Processing, J. Vac. Sci. Technol., B, 1990, vol. 9, pp. 310–317.
Tynan, G.R. et al., Characterization of an Azimuthally Symmetric Helicon Wave High Density Plasma Source, J. Vac. Sci. Technol., A, 1997, vol. 15, pp. 2885–2892.
Chi, K.K., Shin, H.S., Yoo, W.J., Jung, C.O., Koh, Y.B., and Lee, M.Y., Jpn. J. Appl. Phys., 1996, vol. 35, part. 1, p. 2440.
Charles, C., Boswell, R.W., and Kawahara, H., Appl. Phys. Lett., 1995, vol. 67, pp. 40–42.
Kazuhiko, E. and Tatsumi, T., Appl. Phys. Lett., 1996, vol. 68, pp. 2864–2866.
Degeling, A.W., Jung, C.O., Boswell, R.W., and Ellingboe, A.R., Plasma Production From Helicon Waves, Phys. Plasmas, 1996, vol. 3, pp. 2788–2796.
Degeling, A.W. and Boswell, R.W., Modeling Ionization by Helicon Waves, Phys. Plasmas, 1997, vol. 4, pp.2748–2755.
Krall, N. and Trivelpiece, A., Principles of Plasma Physics, New York: Academic, 1973. Translated under the title Osnovy fiziki plazmy, Moscow: Mir, 1975.
Vorob'ev, N.F. and Rukhadze, A.A., Excitation of Helicon in a Plasma Cylinder by Surface Current Sources, Fiz. Plazmy, 1994, vol. 20, pp. 1065–1068.
Shamray, K.P. and Taranov, V.B., Volume and Surface of Power Absorption in a Helicon Plasma Source, PlasmaSources Sci. Technol., 1996, vol. 5, pp. 474–491.
Chen, F.F. and Arnush, D., Generalized Theory of Helicon Waves. I. Normal Modes, Phys. Plasmas, 1997, vol.4, pp. 3411–3421.
Chen, F.F. and Arnush, D., Generalized Theory of Helicon Waves. II. Excitation and Absorption, Phys. Plasmas,1998, vol. 5, pp. 1239–1254.
Chen, F.F., Experiments on Helicon Plasma Sources, J.Vac. Sci. Technol., A, 1992, vol. 10, pp. 1389–1401.
Godyak, V.A. and Piejak, R.B., ICP Diagnostics with Magnetic Probes, J. Phys. IV (France), 1998, vol. 8, part7, pp. 241–255.
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Braginskii, O.V., Vasil'eva, A.N. & Kovalev, A.S. A Helicon Plasma Source. Russian Microelectronics 29, 380–390 (2000). https://doi.org/10.1023/A:1026688002366
Issue Date:
DOI: https://doi.org/10.1023/A:1026688002366