Abstract
The deposition of aluminum on S/Fe(111)(1× 1) at 300 K in UHV results in the formation ofa disordered S-modified Al adlayer. Insertion of Albetween the sulfur atoms and the Fe substrate isindicated by an increase of the S Auger signal withincreasing Al deposition. Room-temperature oxidation ofAl/S/Fe(111) in UHV is inhibited compared to theoxidation of aluminum deposited on the sulfur-freeFe(111). The oxygen-uptake curves and variations in theS(LVV), Fe(MVV) intensities with oxygen exposure arealso consistent with the insertion of the aluminum atomsbetween the S overlayer and the Fe substrate.
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Addepalli, S.G., Lin, JS., Ekstrom, B. et al. Interactions at the Al-S-Fe Interface: S Inhibition of Aluminum Oxidation. Oxidation of Metals 52, 139–153 (1999). https://doi.org/10.1023/A:1026624825215
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DOI: https://doi.org/10.1023/A:1026624825215