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Macrodistribution of Anodic Dissolution Rate at a Rotating Disk Electrode with Partially Insulated Surface

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Abstract

Macrodistribution of etching rates of a macroscopically nonuniform, partially “dipped,” rotating disk electrode of low-carbon steel in 1 M NaCl at pH 1 with photoresist insulation and the density of active rectangular holes being ∼1.6 holes/mm2 is studied at dimensionless etching rates i 0 avg /i l = 0.2–1.1, where i 0 avg is the average current density per active surface and i l the limiting anodic current density determined by the ionic transport rate. The distribution of the average etching rates in the normal direction is determined by the primary current distribution and is insensitive towards the type of the dissolution rate distribution in a cavity.

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Authors and Affiliations

  1. Institute of Applied Physics, Academy of Sciences of Moldova, ul. Akademiei 5, MD-2028, Chisinau, Moldova

    A. I. Dikusar, O. O. Redkozubova & S. P. Yushchenko

  2. Buckbee-Mears Cortland, 30 Kellogg Road, Cortland, NY, 13045 (, USA

    L. B. Kriksunov & D. Harris

Authors
  1. A. I. Dikusar
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  2. O. O. Redkozubova
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  3. S. P. Yushchenko
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  4. L. B. Kriksunov
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  5. D. Harris
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Dikusar, A.I., Redkozubova, O.O., Yushchenko, S.P. et al. Macrodistribution of Anodic Dissolution Rate at a Rotating Disk Electrode with Partially Insulated Surface. Russian Journal of Electrochemistry 39, 1134–1136 (2003). https://doi.org/10.1023/A:1026139907837

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  • DOI: https://doi.org/10.1023/A:1026139907837

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