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High‐Temperature Deposition of Carbon Films

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Journal of Engineering Physics and Thermophysics Aims and scope

Abstract

A mathematical model of growth of a carbon film in high‐temperature deposition has been constructed in the approximation of the Stefan problem. The influence of different factors on the maximum thickness of the film has been analyzed. It has been shown that the porosity of the film is a factor of fundamental importance which determines the dynamics of its growth in terms of the effective thermal conductivity.

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Authors and Affiliations

  1. National Academy of Sciences of Belarus, A. V. Luikov Heat and Mass Transfer Institute, Minsk, Belarus

    S. P. Fisenko & B. N. Bazylev

  2. IHM, Forschungszentrum Karlsruhe, Germany

    H. Wuerz

Authors
  1. S. P. Fisenko
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  2. B. N. Bazylev
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  3. H. Wuerz
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Fisenko, S.P., Bazylev, B.N. & Wuerz, H. High‐Temperature Deposition of Carbon Films. Journal of Engineering Physics and Thermophysics 76, 743–747 (2003). https://doi.org/10.1023/A:1025604901031

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  • DOI: https://doi.org/10.1023/A:1025604901031

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