References
A. Hickling, in “Modern Aspects of Electrochemistry No. 6”, edited by J. O'M. Bockris and B. E. Conway (Plenum Press, New York, 1971) p. 356.
T. Suzuki, T. Ishihara, T. Yamazaki and S. Wada, Jpn. J. Appl. Phys. 36 (1997) L504.
T. Suzuki, M. Tsukada, T. Yamazaki, S. Wada and T. Noma, J. Mater. Sci. 34 (1999) 4761.
T. Suzuki, S. Wada, M. Tsukada, T. Yamazaki and T. Noma, J. European Ceram. Soc. 21 (2001) 331.
A. Hickling, in “Modern Aspects of Electrochemistry No. 6”, edited by J. O'M. Bockris and B. E. Conway (Plenum Press, New York, 1971) p. 335.
J. E. Mahan, in “Physical Vapor Deposition of Thin Films” (John Wiley & Sons, New York, 2000) p. 212.
T. Suzuki, Y. Matsushima, Y. Mori, T. Yamazaki and T. Noma, J. Mater. Sci. 37 (2002) 595.
S. K. Sengupta and O. P. Singh, J. Electroanal. Chem. 369 (1994) 113.
A. Hickling and M. D. Ingram, Trans. Faraday Soc. 60 (1964) 783.
N. Matsunami, Y. Yamamura, Y. Itikawa, N. Itoh, Y. Kazumata, S. Miyagawa, K. Morita, R. Shimizu and H. Tawara, Atomic Data Nucl. Data Tables 31 (1984) 1.
M. Shi, R. A. Baragiola, D. E. Grosjean, R. E. Johnson, S. Jurac and J. Schou, J. Geophys. Res. 100 (1995) 26,387.
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Matsushima, Y., Tezuka, A., Sumida, K. et al. An approach to estimate the sputtering yield of water in glow-discharge electrolysis. Journal of Materials Science Letters 22, 1259–1260 (2003). https://doi.org/10.1023/A:1025454001365
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DOI: https://doi.org/10.1023/A:1025454001365