Abstract
The effect of temperature, pH and current density on the morphology and texture of electrodeposited zinc on mechanically polished steel was studied. The electrodeposited zinc had mostly basal (0 0 0 2) and low angle planes (1014, 1013, 1012) parallel to the surface. At pH 2, increasing overvoltage (i.e., increasing current density or decreasing temperature) reduced the percentage of basal plane and increased the percentage of low angle planes parallel to the substrate surface. Increasing overvoltage decreased the zinc crystal size. At pH 4, increasing current density increased the percentage of both basal and low angle planes parallel to the surface, but increased the zinc crystal size. This variation of behaviour at pH 4 was explained by a change in nucleation mode due to hydroxide adsorption. The nucleation mode was determined by comparing dimensionless (i/i m)2 vs (t/t m) potentiostatic current–time transient graphs with models for instantaneous and progressive nucleation. It was shown that at pH 2, instantaneous nucleation was predominant, whereas at pH 4, it was close to progressive.
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References
N.M. Younman, J. Appl. Electrochem. 30 (2000) 55.
J.P. Millet, M. Gravria, H. Mazille, D. Marchandise and J.M. Cuntz, Surf. Coat. Technol. 123 (2000) 164.
H. Park and J.A. Szpunar, Corros. Sci. 40 (1998) 525.
C.S. Lin, H.B. Lee and S.H. Hsieh, Metall. Trans. A 31 (2000) 475.
R. Weil, Annu. Rev. Mater. Sci. 19 (1989) 165.
M. Sagaiyama, M. Kawabe and T. Watarabe, ISIJ International 10 (1990) 99.
R. Ramanauskas, P. Quintana, L. Maldonado, R. Pomes and M.A. Pech-Canul, Surf. Coat. Technol. 92 (1997) 16.
K. Deblauw, A. Deboeck, J. Bollen and W. Timmermans, Proc. ICOTOM 12 Montreal, Quebec, Canada (1999), p. 1293.
X. Ye, J.P. Celis, M. De Bonte and J.R. Roos, J. Electrochem. Soc. 141 (1994) 2698.
H. Park and J.A. Szpunar, Proc. ICOTOM 12, Montreal, Quebec, Canada (1999), p. 1421.
I. Tomov, CH.R. Cvetkova and V. Velinov, J. Appl. Electrochem. 19 (1989) 377.
Y.B. Yim, W.S. Hwang and S.K. Hwang, J. Electrochem. Soc. 142 (1995) 2604.
H. Nakano, K. Araga, M. Iwai and J. Kawahuhu, Tetsu-to-Hagane 83 (1997) 785.
K. Higashi, H. Fukushima, T. Urawaka, T. Adaniya and K. Matsudo, J. Electrochem. Soc. 128 (1981) 2081.
K.R. Baldwin, C.J.E. Smith and M.J. Robinson, Trans. Inst. Met. Finish. 72 (1994) 79.
T. Tsuru, S. Kobayashi, T. Akiyama, H. Fukushima, S.K. Gogia and R. Kammel, J. Appl. Electrochem. 27 (1997) 209.
G. Trejo, R. Ortega B., Y. Meas V., P. Ozil, E. Chainet and B. Nguyen, J. Electrochem. Soc. 145 (1998) 4090.
J. Yu, H. Cao, Y. Chen, L. Kang and H. Yang, J. Electroanal. Chem. 474 (1999) 69.
P.J. Sonneveld, W. Visscher and E. Barendrecht, Electrochim. Acta 37 (1992) 1199.
M.S. Cruz, F. Alonso and J.M. Palacios, J. Appl. Electrochem. 23 (1993) 364.
J.R. Park and H.T. Kim, Plat. Surf. Finish. 86 (1999) 108.
S.J. Shaffer, J.W. Morris Jr. and H.R. Wenk, Proceedings of 'Zincbased Coating Systems: Metallurgy and Performance', TMS Conference, Michigan (1990), p. 129.
S.J. Shaffer, W.E. Nojima, P.N. Skarpelos and J.W. Morris Jr, in Proceedings, op. cit. [22], 251.
C. Alley, P. Drillet, J.C. Charbonnier, M. Gultmann, A. Takahashi, M. Nakazawa and Y. Miyoshi, Proc. of Galvatech'95, p. 371.
H. Fukushima, T. Akiyama, M. Yano, T. Ishikawa and R. Kammel, ISIJ International 33 (1993) 1009.
I. Tomov, CH.R. Cvetkova and V. Velinov, J. Appl. Electrochem. 19 (1989) 377.
H. Takechi, M. Matsuo, K. Kawasaki and T. Tamura, Proc. ICOTOM 6, Tokyo, Japan (1981), p. 209.
E. Gomez, X. Alcobe and E. Valles, J. Electroanal. Chem. 505 (2001) 54.
E. Gomez and E. Valles, J. Electroanal. Chem. 397 (1995) 177.
M. Eyraud, Z. Hanane and J. Crousier, Surf. Coat. Technol. 67 (1994) 35.
B. Scharifker and G. Hills, Electrochim. Acta 28 (1983) 879.
L. Heerman and A. Tarallo, J. Electroanal. Chem. 470 (1999) 70.
C. Cachet and R. Wiart, J. Electrochem. Soc. 131 (1994) 141.
R. Ichino, C. Cachet and R. Wiart, Electrochim. Acta 41 (1996) 1031.
H.M. Wang and T.J. Okeefe, Plat. Surf. Finish. 83 (1996) 149.
T. Furuhara, N. Sugia and T. Maki, ISIJ International 36 (1996) 584.
Y. Ohmori, K. Nakai, H. Ohtsubo, T. Yagi and T. Matsumoto, ISIJ International 33 (1993) 1196.
H. Ohtsubo, T. Matsumoto, K. Nakai and Y. Ohmori, ISIJ International 34 (1994) 1002.
E. Budevski, G. Staikow and W.J. Lorenz, Electrochim. Acta 45 (2000) 2559.
E. Chassaing and R. Wiart, Electrochim. Acta 37 (1992) 545.
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Raeissi, K., Saatchi, A. & Golozar, M. Effect of nucleation mode on the morphology and texture of electrodeposited zinc. Journal of Applied Electrochemistry 33, 635–642 (2003). https://doi.org/10.1023/A:1024914503902
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DOI: https://doi.org/10.1023/A:1024914503902