Abstract
This paper describes the growth of the collector, base, and emitter layers of a SiGe HBT in a single epitaxy process. A non-selective SiGe heterojunction bipolar transistor growth process at 700 °C has been developed, which combines n-type doping for the Si collector, p-type doping for the SiGe base and n-type doping for the Si emitter cap. Control of the collector doping concentration by varying the growth conditions is shown. The boron tailing edge from the SiGe base into the Si emitter layer was removed by interrupting the growth process with a hydrogen flow after the SiGe base growth but before the Si emitter growth to remove the dopant gas from the chamber. The layer thicknesses are compared using three different analytical techniques–secondary ion mass spectroscopy (SIMS), transmission electron microscopy (TEM), and spectroellipsometry. A good agreement was obtained for the three different methods.
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K. Washio, E. Ohue, H. Shimamoto, K. Oda, R. Hayami, Y. Kiyota, M. Tanabe, M. Kondo, T. Hashimoto and T. Harada, Proceedings of the International Electron Device Meeting, December 2000, p. 741.
G. Freeman, D. Ahlgren, D. R. Greenberg, R. Groves, F. Huang, G. Hugo, B. Jagannathan, S. J. Jeng, J. Hohnson, K. Schonenberg, K. Stein, R. Volant and S. Subbanna, Proceedings of the International Electron Device Meeting, December 1999, p. 569.
A. SchÜppen, M. Tortschanoff, J. Berntgen, P. Maier, D. Zerrweck, H. Von Der Ropp, J. Tolonocs and K. Burger, Proceedings of the European Solid-State Device Research Conference, September 2000, p. 88.
T. Hashimoto, F. Sato, T. Aoyama, H. Suzuki, H. Yoshida, H. Fujii and T. Yamazaki, Proceedings of the International Electron Device Meeting, December 2000, p. 149.
W. Y. Leong, A. C. Churchill, D. J. Robbins and A. Lambert, Thin Solid Films 294 (1997) 274.
J. M. Bonar, J. Schiz and P. Ashburn, J. Mater. Sci.: Mater. Electron. 10 (1999) 345.
J. A. Wollam, B. Johs, C. M. Herzinger, J. Hilfiker, R. Synowicki and C. L. Bungay, Crit. Rev. Opt. Sci. Technol. CR72 (1999) 3.
E. A. Irene, Thin Solid Films 233 (1993) 96.
R. T. Carline, C. Pickering, D. J. Robbins, W. Y. Leong, A. D. Pitt and A. G. Cullis, Appl. Phys. Lett. 64 (1994) 1114.
C. Pickering and R. T. Carline, J. Appl. Phys. 75 (1994) 4642.
S. Zollner, J. J. Hildreth, R. Liu, P. Zaumseil, M. Weidner and B. Tillack, ibid. 88 (2000) 4102.
R. Reif, T. I. Kamins and K. C. Saraswat, J. Electrochem. Soc. 126 (1979) 644.
J. M. Bonar, PhD Thesis, Department of Electronics and Computer Science, University of Southampton, United Kingdom, (1996).
P. D. Agnello, T. O. Sedgwick and J. Cotte, J. Electrochem. Soc. 140 (1993) 2703.
A. J. Joseph, J. D. Cressler, D. M. Richey and G. Niu, IEEE Trans. Electron. Devices 46 (1999) 1347.
E. Kasper, H. Kibbel, H. J. Herzog and A. Gruhle, Jpn. J. Appl. Phys. Part 1 33 (1994) 2415.
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El Mubarek, H.A.W., Bonar, J.M., Ashburn, P. et al. Non-selective growth of SiGe heterojunction bipolar trasistor layers at 700 °C with dual control of n- and p-type dopant profiles. Journal of Materials Science: Materials in Electronics 14, 261–265 (2003). https://doi.org/10.1023/A:1023947122399
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DOI: https://doi.org/10.1023/A:1023947122399