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Optical waveguides on polysilicon-on-insulator

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Abstract

Optical waveguide structures have been fabricated on polysilicon-on-insulator. Structural and optical properties of the waveguides are studied by X-ray diffraction, atomic force microscopy, scanning electron microscopy, and transmission measurements. Reasons for the waveguide loss are discussed. It is found that surface roughness can be responsible for a waveguide loss of more than 60 dB cm−1 and that additional loss mechanisms probably exist. Methods of smoothing the surface are discussed.

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Authors and Affiliations

  1. Optoelectronics Laboratory, Helsinki University of Technology, P.O. Box 3500, FIN-, 02015, HUT, Finland

    A. Säynätjoki, J. Riikonen & H. Lipsanen

  2. VTT Centre for Microelectronics, P.O. Box 1208, FIN-, 02044, VTT, Finland

    J. Ahopelto

Authors
  1. A. Säynätjoki
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  2. J. Riikonen
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  3. H. Lipsanen
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  4. J. Ahopelto
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Säynätjoki, A., Riikonen, J., Lipsanen, H. et al. Optical waveguides on polysilicon-on-insulator. Journal of Materials Science: Materials in Electronics 14, 417–420 (2003). https://doi.org/10.1023/A:1023921305986

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  • DOI: https://doi.org/10.1023/A:1023921305986

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