Abstract
The onset temperature of radical formation in the stepwise thermolysis of polyunsaturated polycarbosilane —[(Me2SiC≡C)4Me2SiCH=CH] n — with n > 2 was found by ESR spectroscopy. Beginning from 230°C two types of radicals are formed. The first radical arises on heating to 240°C due to the delocalization of unpaired electrons over the polyunsaturated polymer systems to H atoms of the Et groups of the polymer. The second radical appears at temperatures ≥240°C due to delocalization to H atoms of the Me groups through the vacant 3d-orbital of the Si atom.
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Berveno, V.P., Bryukhovetskaya, L.V., Voronkov, M.I. et al. Formation of radicals in stepwise thermolysis of polyunsaturated polycarbosilane —[(Me2SiC≡C)4Me2SiCH=CH] n —. Russian Chemical Bulletin 52, 764–767 (2003). https://doi.org/10.1023/A:1023904116820
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DOI: https://doi.org/10.1023/A:1023904116820