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High-Rate IR Laser Evaporation of Silica Glass

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Inorganic Materials Aims and scope

Abstract

IR (10.6 μm) laser irradiation of silica glass preforms ensures rapid evaporation of the surface layer. The resulting deposit consists of amorphous SiO2 with a particle size of ∼ 70 nm.

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Authors and Affiliations

  1. Babakin Research Center (Federal State Unitary Enterprise), Khimki, Moscow oblast, Russia

    V. K. Sysoev, V. I. Masychev & N. P. Glukhoedov

  2. Institute of Fine Mechanics and Optics, ul. Sablinskaya 14, St. Petersburg, 197101, Russia

    B. P. Papchenko

  3. Russian Academy of Sciences, Prokhorov General Physics Institute, ul. Vavilova 38, Moscow, 117942, Russia

    S. Ya. Rusanov & A. A. Yakovlev

Authors
  1. V. K. Sysoev
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  2. V. I. Masychev
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  3. B. P. Papchenko
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  4. S. Ya. Rusanov
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  5. A. A. Yakovlev
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  6. N. P. Glukhoedov
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Sysoev, V.K., Masychev, V.I., Papchenko, B.P. et al. High-Rate IR Laser Evaporation of Silica Glass. Inorganic Materials 39, 532–537 (2003). https://doi.org/10.1023/A:1023689031551

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  • DOI: https://doi.org/10.1023/A:1023689031551

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