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Electrical properties of the Pt/Sr0.85Bi2.4Ta2O9/TiO2/Si structure with variation of the Sr0.85Bi2.4Ta2O9 film thickness

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Journal of Materials Science Letters

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Authors and Affiliations

  1. Department of Materials Science and Engineering, Hong-Ik University, Seoul, 121-791, Korea

    J. W. Kim, J. D. Park, J. H. Choi & T. S. Oh

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  1. J. W. Kim
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  2. J. D. Park
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  3. J. H. Choi
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  4. T. S. Oh
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Kim, J.W., Park, J.D., Choi, J.H. et al. Electrical properties of the Pt/Sr0.85Bi2.4Ta2O9/TiO2/Si structure with variation of the Sr0.85Bi2.4Ta2O9 film thickness. Journal of Materials Science Letters 22, 535–537 (2003). https://doi.org/10.1023/A:1022994521453

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  • DOI: https://doi.org/10.1023/A:1022994521453

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