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Full Wafer In Situ Deposition of Thallium Lead Superconductors

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Abstract

Thin films of (Tl,Pb)Sr2Ca0.8Y0.2Cu2O7, and (Tl,Pb)Sr2CuO5 can be grown in a single step process which involves sputter deposition from a mixed oxide target and simultaneous thermal evaporation of Tl2O. The use of a radiant heater has allowed extension of this in situ deposition process to full LaAlO3 and NdGaO3 wafers. Variations in the composition of the deposited film is < 4% across a 50 mm wafer while the thickness uniformity is ≍ 8%. The highest transition temperature for a (Tl,Pb)Sr2Ca0.8Y0.2 Cu2O7 film thus far is 83 K. The RMS surface roughness of (Tl,Pb)Sr2CuO5 films is uniform across the wafer and approximately 1% of the film thickness for films 20 to 100 nm thick.

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REFERENCES

  1. D. W. Face and J. P. Nestlerode, Appl. Phys. Lett. 61, 1838 (1992).

    Article  ADS  Google Scholar 

  2. K. E. Myers, D. W. Face, D. J. Kountz, and J. P. Nestlerode, Appl. Phys. Lett. 65, 490 (1994).

    Article  ADS  Google Scholar 

  3. K. E. Myers, D. W. Face, D. J. Kountz, J. P. Nestlerode, and C. F. Carter, IEEE Trans. on Appl. Supercond. 5, 1684 (1995).

    Article  Google Scholar 

  4. N. Reschauer, U. Spreitzer, W. Brozio, A. Piehler, and K. F. Renk, Appl. Phys. Lett. 68, 1000 (1996).

    Article  ADS  Google Scholar 

  5. D. W. Face, D. J. Kountz, and J. P. Nestlerode, “Insitu Growth and Properties of Epitaxial TlBa2(Ca1−xYx)Cu2O7 Films and Multilayers” in Advances in Superconductivity VI, T. Fujita and Y. Shinohara, Eds., p.863., Springer-Verlag, Tokyo. 1994.

    Google Scholar 

  6. Dean W. Face, U. S. patent #5,439,877.

  7. Ann C. Westerheim, Ph.D. Thesis, M. I. T., Boston, MA, 1992.

  8. P. Berberich, J Tate, W. Dietsche, and H. Kinder, Appl. Phys. Lett. 53, 925 (1988).

    Article  ADS  Google Scholar 

  9. A. C. Westerheim, B. I. Choi, R. L. Slattery, M. I. Fink, M. J. Cima, and Alfredo C. Anderson, J. Vac. Sci. Tech. A 10, 3407 (1992).

    Article  ADS  Google Scholar 

  10. Z. M. Zhang, B. I. Choi, M. I. Fink, and Alfredo C. Anderson, J. Opt. Soc. Am. B 11, 2252 (1994).

    Article  ADS  Google Scholar 

  11. W. L. Holstein, J. Phys. Chem. 97, 4224 (1993).

    Article  Google Scholar 

Download references

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Authors and Affiliations

  1. DuPont Superconductivity, Experimental Station, Wilmington, DE, 19880-0304

    Lijie Bao

Authors
  1. K. E. Myers
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  2. Lijie Bao
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Myers, K.E., Bao, L. Full Wafer In Situ Deposition of Thallium Lead Superconductors. Journal of Superconductivity 11, 129–132 (1998). https://doi.org/10.1023/A:1022683307738

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  • DOI: https://doi.org/10.1023/A:1022683307738

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