Abstract
In this review, existing approaches for the manipulation and/or construction of isolated semiconductor nanoclusters into deliberate, patterned arrays are described. Diverse examples of different strategies from solid state, solution, and hybrid combinations are described as well as successes achieved to date. The approaches to be discussed include conventional solid state lithography, volumetric constriction of monodisperse nanoclusters deposited from solution, and the use of anchored macromolecular templates to direct semiconductor nanocluster assembly.
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Coffer, J.L. Approaches for Generating Mesoscale Patterns of Semiconductor Nanoclusters. Journal of Cluster Science 8, 159–178 (1997). https://doi.org/10.1023/A:1022679923799
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DOI: https://doi.org/10.1023/A:1022679923799