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Dielectric Properties of Vitreous Silica with Various Hydroxyl Concentrations

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Abstract

We investigated the temperature dependence of the dielectric susceptibility of amorphous silica below 300 mK. The influence of glass matrix and hydroxyl concentration (<OH − >) was studied to investigate the suitability for thermometry. We obtained Suprasil samples with <OH − > between 200 and 1000 ppm by annealing in vacuum. We also measured commercial Homosil glass. The sensitivity is proportional to <OH − >, but saturation of the dielectric susceptibility occurs at the same temperature for all samples.

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Authors and Affiliations

  1. Kamerlingh Onnes Laboratorium, Leiden University, P.O. Box, 2300 RA, Leiden, The Netherlands

    Richard van Rooijen, Alexei Marchenkov, Hikota Akimoto, Reijer Jochemsen & Giorgio Frossati

Authors
  1. Richard van Rooijen
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  2. Alexei Marchenkov
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  3. Hikota Akimoto
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  4. Reijer Jochemsen
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  5. Giorgio Frossati
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van Rooijen, R., Marchenkov, A., Akimoto, H. et al. Dielectric Properties of Vitreous Silica with Various Hydroxyl Concentrations. Journal of Low Temperature Physics 110, 269–274 (1998). https://doi.org/10.1023/A:1022520329931

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  • DOI: https://doi.org/10.1023/A:1022520329931

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