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Kurochkin, Y.V., Demin, Y.N. & Zverev, A.A. Industrial High Voltage-Current Ratio Plasmotrons. Chemical and Petroleum Engineering 38, 564–567 (2002). https://doi.org/10.1023/A:1022012620798
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DOI: https://doi.org/10.1023/A:1022012620798